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    The influence of Bi doping in the thermoelectric properties of co-sputtering deposited bismuth antimony telluride thin films

    New search for: Fan, P.
    New search for: Chen, T.
    New search for: Zheng, Z.
    New search for: Zhang, D.
    New search for: Cai, X.
    New search for: Cai, Z.
    New search for: Huang, Y.

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    The influence of Bi doping in the thermoelectric properties of co-sputtering deposited bismuth antimony telluride thin films

    New search for: Fan, P.
    New search for: Chen, T.
    New search for: Zheng, Z.
    New search for: Zhang, D.
    New search for: Cai, X.
    New search for: Cai, Z.
    New search for: Huang, Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    The influence of Bi doping in the thermoelectric properties of co-sputtering deposited bismuth antimony telluride thin films

    New search for: Fan, P.
    New search for: Chen, T.
    New search for: Zheng, Z.
    New search for: Zhang, D.
    New search for: Cai, X.
    New search for: Cai, Z.
    New search for: Huang, Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    The influence of Bi doping in the thermoelectric properties of co-sputtering deposited bismuth antimony telluride thin films

    Contributors:

    Fan, P. (author) / Chen, T. (author) / Zheng, Z. (author) / Zhang, D. (author) / Cai, X. (author) / Cai, Z. (author) / Huang, Y. (author)

    Published in:

    MATERIALS RESEARCH BULLETIN ; 48 ; 333-336

    Publication date:

    2013-01-01

    Size:

    4 pages

    ISSN:

    0025-5408

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11 / 620

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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