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Ultrathin Limit of Exchange Bias Coupling at Oxide Multiferroic/Ferromagnetic Interfaces
Ultrathin Limit of Exchange Bias Coupling at Oxide Multiferroic/Ferromagnetic Interfaces
Ultrathin Limit of Exchange Bias Coupling at Oxide Multiferroic/Ferromagnetic Interfaces
Huijben, M. (author) / Yu, P. (author) / Martin, L. W. (author) / Molegraaf, H. J. (author) / Chu, Y. H. (author) / Holcomb, M. B. (author) / Balke, N. (author) / Rijnders, G. (author) / Ramesh, R. (author)
ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 25 ; 4739-4745
2013-01-01
7 pages
Article (Journal)
English
DDC:
620.11
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