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    Monte Carlo Simulation of Electron Trajectory in Solid for Electron Beam Lithography

    New search for: Nagao, A.
    New search for: Hosaka, S.
    New search for: Hosaka, S.

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    Monte Carlo Simulation of Electron Trajectory in Solid for Electron Beam Lithography

    New search for: Nagao, A.
    New search for: Hosaka, S.
    New search for: Hosaka, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Monte Carlo Simulation of Electron Trajectory in Solid for Electron Beam Lithography

    New search for: Nagao, A.
    New search for: Hosaka, S.
    New search for: Hosaka, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Monte Carlo Simulation of Electron Trajectory in Solid for Electron Beam Lithography

    Contributors:

    Nagao, A. (author) / Hosaka, S. (author) / Hosaka, S.

    Published in:

    Advanced Micro-Device Engineering IV ; 101-106

    KEY ENGINEERING MATERIALS ; 596

    Publication date:

    2014-01-01

    Size:

    6 pages

    ISSN:

    1013-9826

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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