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Anisotropic distribution of residual strain around conical nanoindentation in silicon

Li, X. / Li, Z. / Ren, L. L. / Gao, S. T. / Xu, G. F. / Tao, X. F.

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Anisotropic distribution of residual strain around conical nanoindentation in silicon

Li, X. / Li, Z. / Ren, L. L. / Gao, S. T. / Xu, G. F. / Tao, X. F.

Anisotropic distribution of residual strain around conical nanoindentation in silicon

Li, X. / Li, Z. / Ren, L. L. / Gao, S. T. / Xu, G. F. / Tao, X. F.

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Check availability in my library

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Document information

Title:

Anisotropic distribution of residual strain around conical nanoindentation in silicon

Contributors:

Li, X. (author) / Li, Z. (author) / Ren, L. L. (author) / Gao, S. T. (author) / Xu, G. F. (author) / Tao, X. F. (author)

Published in:

MATERIALS LETTERS ; 137 ; 389-392

Publication date:

2014-01-01

Size:

4 pages

ISSN:

0167-577X

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.1105 / 530

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