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Determination of Schottky barrier heights and Fermi-level unpinning at the graphene/n-type Si interfaces by X-ray photoelectron spectroscopy and Kelvin probe
Determination of Schottky barrier heights and Fermi-level unpinning at the graphene/n-type Si interfaces by X-ray photoelectron spectroscopy and Kelvin probe
Determination of Schottky barrier heights and Fermi-level unpinning at the graphene/n-type Si interfaces by X-ray photoelectron spectroscopy and Kelvin probe
Lin, Y. J. (author) / Zeng, J. J. (author)
APPLIED SURFACE SCIENCE ; 322 ; 225-229
2014-01-01
5 pages
Article (Journal)
English
DDC:
621.35
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