Structure and Photoelectric Properties of Cu~3N Thin Films by Reactive Magnetron Sputtering: Fid-Bau Portal

Structure and Photoelectric Properties of Cu~3N Thin Films by Reactive Magnetron Sputtering

Leng, J.F. / Chen, L.N. / Zhu, X.Z. / Sun, Z.H.

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Structure and Photoelectric Properties of Cu~3N Thin Films by Reactive Magnetron Sputtering

Leng, J.F. / Chen, L.N. / Zhu, X.Z. / Sun, Z.H.

Structure and Photoelectric Properties of Cu~3N Thin Films by Reactive Magnetron Sputtering

Leng, J.F. / Chen, L.N. / Zhu, X.Z. / Sun, Z.H.

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Check availability in my library

Order at Subito €

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Document information

Title:

Structure and Photoelectric Properties of Cu~3N Thin Films by Reactive Magnetron Sputtering

Contributors:

Leng, J.F. (author) / Chen, L.N. (author) / Zhu, X.Z. (author) / Sun, Z.H. (author)

Published in:

MATERIALS SCIENCE FORUM ; 814 ; 620-624

Publication date:

2015-01-01

Size:

5 pages

ISSN:

0255-5476

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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