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Stereological correction method based on sectional texture analysis for the liberation distribution of binary particle systems
Stereological correction method based on sectional texture analysis for the liberation distribution of binary particle systems
Stereological correction method based on sectional texture analysis for the liberation distribution of binary particle systems
Ueda, Takao (author) / Oki, Tatsuya (author) / Koyanaka, Shigeki (author)
Advanced powder technology ; 28 ; 1391-1398
2017-01-01
8 pages
Article (Journal)
English
DDC:
620.4305
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