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RF plasma enhanced MOCVD of yttria stabilized zirconia thin films using octanedionate precursors and their characterization
RF plasma enhanced MOCVD of yttria stabilized zirconia thin films using octanedionate precursors and their characterization
RF plasma enhanced MOCVD of yttria stabilized zirconia thin films using octanedionate precursors and their characterization
Chopade, S.S. (author) / Nayak, C. (author) / Bhattacharyya, D. (author) / Jha, S.N. (author) / Tokas, R.B. (author) / Sahoo, N.K. (author) / Deo, M.N. (author) / Biswas, A. (author) / Rai, Sanjay (author) / Thulasi Raman, K.H. (author)
Applied surface science ; 355 ; 82-92
2015-01-01
11 pages
Article (Journal)
English
DDC:
620.44
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