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    Electrochemical measurements and atomistic simulations of Cl−-induced passivity breakdown on a Cu2O film

    New search for: Wei, Xin
    New search for: Dong, Chaofang
    New search for: Yi, Pan
    New search for: Xu, Aoni
    New search for: Chen, Zhanghua
    New search for: Li, Xiaogang

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    Electrochemical measurements and atomistic simulations of Cl−-induced passivity breakdown on a Cu2O film

    New search for: Wei, Xin
    New search for: Dong, Chaofang
    New search for: Yi, Pan
    New search for: Xu, Aoni
    New search for: Chen, Zhanghua
    New search for: Li, Xiaogang

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Electrochemical measurements and atomistic simulations of Cl−-induced passivity breakdown on a Cu2O film

    New search for: Wei, Xin
    New search for: Dong, Chaofang
    New search for: Yi, Pan
    New search for: Xu, Aoni
    New search for: Chen, Zhanghua
    New search for: Li, Xiaogang

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

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    Document information
    Title:

    Electrochemical measurements and atomistic simulations of Cl−-induced passivity breakdown on a Cu2O film

    Contributors:

    Wei, Xin (author) / Dong, Chaofang (author) / Yi, Pan (author) / Xu, Aoni (author) / Chen, Zhanghua (author) / Li, Xiaogang (author)

    Published in:

    Corrosion science ; 136 ; 119-128

    Publication date:

    2018-01-01

    Size:

    10 pages

    ISSN:

    0010-938X

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11223

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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