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Effect of the deposition conditions on the properties of photocatalytic WO3 thin films prepared by mid-frequency magnetron sputtering
Effect of the deposition conditions on the properties of photocatalytic WO3 thin films prepared by mid-frequency magnetron sputtering
Effect of the deposition conditions on the properties of photocatalytic WO3 thin films prepared by mid-frequency magnetron sputtering
Li, H. (author) / Mu, Z.X. (author) / Liu, S.G. (author) / Zhang, J.L. (author)
Materials science in semiconductor processing ; 99 ; 99-105
2019-01-01
7 pages
Article (Journal)
English
DDC:
621.38152
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