A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
Soft UV nanoimprint lithography: concept, development, and fabrication of nanostructures with tunable feature sizes at constant pitch
The thrilling development of the nanoimprint lithography (NIL) over the past twenty years has made the large area nanopatterning from an obstacle to the bridge between imagination and reality. This thesis addresses the establishment of NIL technique at the Institute of Micro- and Nanotechnologies (IMN) of Technische Universität Ilmenau and the development of the soft UV-NIL. The fabrications of periodic nanostructures with tunable feature sizes in large area and at low cost as well as its additional applications are investigated. A center-to-edge imprint scheme in ambient atmosphere using soft stamps is employed throughout this work. The advantages of soft UV-NIL have been identified all along and have drawn tremendous research attention. To clarify the potential issues for imprint in ambient atmosphere, a type of bi-layer soft stamp with a soft Polydimethylsiloxane (PDMS) back carrier and a thin feature layer employing various material is configured. The bi-layer soft stamps such as PDMS/PDMS, PDMS/organic solvent diluted PDMS, PDMS/X-PDMS, PDMS/vvsPDMS, PDMS/UV-PDMS, are comparatively characterized. High stamp reusability and imprint uniformity of the PDMS/PDMS, PDMS/toluene-diluted PDMS and PDMS/UV-PDMS stamps have been validated at ambient conditions for at least twenty consecutive imprints by using a single stamp. This demonstrates the suitability of NIL for batch fabrication of nanoimprinted structures on wafer scale. Based on the solid imprint performance of the ambient center-to-edge scheme, a process chain to fabricate nanostructures with tunable feature sizes at constant pitch (NanoTuFe) is designed and realized in this thesis. A master with positive or negative nanopatterns is prepared to initialize the fabrication process. An intermediate template featuring sloping sidewalls is introduced to bridge the original master and the final patterns. Taking advantage of the sloping sidewalls of the patterns on the intermediate template, the etch-mask on the final substrate can be opened to discrete dimensions ...
Soft UV nanoimprint lithography: concept, development, and fabrication of nanostructures with tunable feature sizes at constant pitch
The thrilling development of the nanoimprint lithography (NIL) over the past twenty years has made the large area nanopatterning from an obstacle to the bridge between imagination and reality. This thesis addresses the establishment of NIL technique at the Institute of Micro- and Nanotechnologies (IMN) of Technische Universität Ilmenau and the development of the soft UV-NIL. The fabrications of periodic nanostructures with tunable feature sizes in large area and at low cost as well as its additional applications are investigated. A center-to-edge imprint scheme in ambient atmosphere using soft stamps is employed throughout this work. The advantages of soft UV-NIL have been identified all along and have drawn tremendous research attention. To clarify the potential issues for imprint in ambient atmosphere, a type of bi-layer soft stamp with a soft Polydimethylsiloxane (PDMS) back carrier and a thin feature layer employing various material is configured. The bi-layer soft stamps such as PDMS/PDMS, PDMS/organic solvent diluted PDMS, PDMS/X-PDMS, PDMS/vvsPDMS, PDMS/UV-PDMS, are comparatively characterized. High stamp reusability and imprint uniformity of the PDMS/PDMS, PDMS/toluene-diluted PDMS and PDMS/UV-PDMS stamps have been validated at ambient conditions for at least twenty consecutive imprints by using a single stamp. This demonstrates the suitability of NIL for batch fabrication of nanoimprinted structures on wafer scale. Based on the solid imprint performance of the ambient center-to-edge scheme, a process chain to fabricate nanostructures with tunable feature sizes at constant pitch (NanoTuFe) is designed and realized in this thesis. A master with positive or negative nanopatterns is prepared to initialize the fabrication process. An intermediate template featuring sloping sidewalls is introduced to bridge the original master and the final patterns. Taking advantage of the sloping sidewalls of the patterns on the intermediate template, the etch-mask on the final substrate can be opened to discrete dimensions ...
Soft UV nanoimprint lithography: concept, development, and fabrication of nanostructures with tunable feature sizes at constant pitch
Si, Shuhao (author) / Hoffmann, Martin / Sinzinger, Stefan / Hillmer, Hartmut
2018-01-01
Theses
Electronic Resource
English
Tailoring Nanostructures Using Copolymer Nanoimprint Lithography
| British Library Online Contents | 2012
| British Library Online Contents | 2011
Fabrication of the similar porous alumina silicon template for soft UV nanoimprint lithography
| British Library Online Contents | 2013
Fabrication of structures with tunable morphologies and sizes by soft molding
| British Library Online Contents | 2005