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Tungsten fuzz growth at low temperatures (<900 K) on a surface with nanocones
The tungsten (W) fuzzy structure was widely observed in linear plasma devices under the fusion-relevant condition. This type of structure can be used in many application fields benefiting from its larger surface area and high optical absorbance. However, W fuzz can be barely formed when the sample temperature is lower than 900 K. This study decreased the threshold to ∼800 K using W co-deposition on a Si nanocones substrate. It suggests that the conventional threshold temperature is only necessary for He bubble rupture to create a rough surface that induces the uneven trapping of the adatom diffusion.
Tungsten fuzz growth at low temperatures (<900 K) on a surface with nanocones
The tungsten (W) fuzzy structure was widely observed in linear plasma devices under the fusion-relevant condition. This type of structure can be used in many application fields benefiting from its larger surface area and high optical absorbance. However, W fuzz can be barely formed when the sample temperature is lower than 900 K. This study decreased the threshold to ∼800 K using W co-deposition on a Si nanocones substrate. It suggests that the conventional threshold temperature is only necessary for He bubble rupture to create a rough surface that induces the uneven trapping of the adatom diffusion.
Tungsten fuzz growth at low temperatures (<900 K) on a surface with nanocones
Quan Shi (author) / Shin Kajita (author) / Noriyasu Ohno (author)
2024
Article (Journal)
Electronic Resource
Unknown
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Tungsten fuzz growth at low temperatures (<900 K) on a surface with nanocones
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