Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

    4547404 Chemical vapor deposition process

    Bryant Campbell, Nicholas Miller assigned to Anicon Inc

    Access

    Check access
    Check availability in my library
    Order at Subito €

    Access

    Check access
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    4547404 Chemical vapor deposition process

    Bryant Campbell, Nicholas Miller assigned to Anicon Inc

    Access

    Check access
    Check availability in my library
    Order at Subito €

    4547404 Chemical vapor deposition process

    Bryant Campbell, Nicholas Miller assigned to Anicon Inc

    Access

    Check access
    Check availability in my library
    Order at Subito €

    Access

    Check access
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    4547404 Chemical vapor deposition process

    Subtitle:

    Bryant Campbell, Nicholas Miller assigned to Anicon Inc

    Published in:

    Environmental International ; 13 ; VIII-IX

    Publication date:

    1987-01-01

    ISSN:

    0160-4120

    DOI:

    https://doi.org/10.1016/0160-4120(87)90119-X

    Type of media:

    Article (Journal)

    Type of material:

    Electronic Resource

    Language:

    English

    Similar titles

    THERMAL CHEMICAL VAPOR DEPOSITION PRODUCT AND PROCESS OF USING A THERMAL CHEMICAL VAPOR DEPOSITION PRODUCT

    MATTZELA JAMES B / YUAN MIN / SMITH DAVID A et al. | European Patent Office | 2016

    Free access

    Thermal Plasma Chemical Vapor Deposition

    Heberlein, J. / Pfender, E. | British Library Online Contents | 1993

    A novel Cu(II) chemical vapor deposition precursor: Synthesis, characterization, and chemical vapor deposition

    Devi, A. / Goswami, J. / Lakshmi, R. et al. | British Library Online Contents | 1998

    Principles of Chemical Vapor Deposition

    Dobkin, Daniel Mark / Zuraw, Michael K. | TIBKAT | 2003

    THERMAL CHEMICAL VAPOR DEPOSITION SPLIT-FUNCTIONALIZATION PROCESS, PRODUCT, AND COATING

    YUAN MIN / SILVIS PAUL H / SMITH DAVID A et al. | European Patent Office | 2017

    Free access
    Back to top