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PLASMA RESISTANT MEMBER
This plasma resistant member comprises a base material and a layered structure which is formed on a surface of the base material, includes an yttria polycrystal body and has plasma resistance, and is characterized in that the layered structure comprises a first relief structure and a second relief structure which is formed by being superimposed on the first relief structure and has finer irregularities than the first relief structure. The present invention is capable of increasing adhesive strength or adhesion of a film that covers the inner wall of a chamber or is capable of reducing particles.
PLASMA RESISTANT MEMBER
This plasma resistant member comprises a base material and a layered structure which is formed on a surface of the base material, includes an yttria polycrystal body and has plasma resistance, and is characterized in that the layered structure comprises a first relief structure and a second relief structure which is formed by being superimposed on the first relief structure and has finer irregularities than the first relief structure. The present invention is capable of increasing adhesive strength or adhesion of a film that covers the inner wall of a chamber or is capable of reducing particles.
PLASMA RESISTANT MEMBER
IWASAWA JUNICHI (author) / AOSHIMA TOSHIHIRO (author)
2015-09-02
Patent
Electronic Resource
English
IPC:
C04B
Kalk
,
LIME