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Underground garage leveling layer anti-condensation and anti-random crack structure
The invention relates to the technical field of buildings, in particular to an underground garage leveling layer anti-condensation and anti-random crack structure. The structure comprises a bottom plate, a wear-resisting layer is arranged on the top surface of the bottom plate, and a curing agent is arranged on the top surface of the wear-resisting layer. The wear-resistant layer is arranged on the top surface of the bottom plate, the wear-resistant layer is coated with the curing agent, and the basement surface layer is made of the hydrophilic and breathable inorganic facing material, so thatthe dew point condensation condition of the smooth surface of the basement floor is prevented.
本发明涉及建筑技术领域,特别涉及一种地下车库找平层防结露、防随机裂缝构造,包括:底板,其顶面设置耐磨层,所述耐磨层顶面设置固化剂。通过在底板的顶面设置耐磨层,并且在耐磨层上涂刷固化剂,地下室面层为亲水透气型无机饰面材料,防止地下室地面光滑面露点结露情况的发生。
Underground garage leveling layer anti-condensation and anti-random crack structure
The invention relates to the technical field of buildings, in particular to an underground garage leveling layer anti-condensation and anti-random crack structure. The structure comprises a bottom plate, a wear-resisting layer is arranged on the top surface of the bottom plate, and a curing agent is arranged on the top surface of the wear-resisting layer. The wear-resistant layer is arranged on the top surface of the bottom plate, the wear-resistant layer is coated with the curing agent, and the basement surface layer is made of the hydrophilic and breathable inorganic facing material, so thatthe dew point condensation condition of the smooth surface of the basement floor is prevented.
本发明涉及建筑技术领域,特别涉及一种地下车库找平层防结露、防随机裂缝构造,包括:底板,其顶面设置耐磨层,所述耐磨层顶面设置固化剂。通过在底板的顶面设置耐磨层,并且在耐磨层上涂刷固化剂,地下室面层为亲水透气型无机饰面材料,防止地下室地面光滑面露点结露情况的发生。
Underground garage leveling layer anti-condensation and anti-random crack structure
一种地下车库找平层防结露、防随机裂缝构造
XIE ZHONGLEI (author) / ZHANG GUOCAN (author) / CHEN FANGMING (author) / CHEN YI (author) / YU WENLONG (author) / RAO CHENGYI (author) / JIANG HONGCHAO (author) / LUO LINA (author) / ZHANG YESHENG (author)
2020-10-27
Patent
Electronic Resource
Chinese
IPC:
E02D
FOUNDATIONS
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Gründungen