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Station hall elevator arrangement structure
The invention relates to the technical field of civil construction engineering, and discloses a station hall elevator arrangement structure. The station hall elevator arrangement structure comprises a station hall top plate, a station hall bottom plate, a station hall middle plate and two bearing walls. An elevator hole is formed in the station hall middle plate, the bearing walls penetrate through the station hall middle plate and are arranged between the station hall bottom plate and the station hall top plate, and the two bearing walls are oppositely arranged and are arranged on the two sides of the elevator hole. The problem that in the prior art, when a station hall elevator is arranged, occupied space is large is solved.
本发明涉及土木建筑工程技术领域,公开了一种站厅电梯布置结构,包括站厅顶板、站厅底板和站厅中板,还包括承重墙,所述站厅中板形成电梯孔洞,所述承重墙穿设所述站厅中板并设于所述站厅底板和站厅顶板之间,所述承重墙为相对设置的两个且设于所述电梯孔洞的两侧。本发明解决了现有技术在站厅电梯布置时所造成空间占用大的问题。
Station hall elevator arrangement structure
The invention relates to the technical field of civil construction engineering, and discloses a station hall elevator arrangement structure. The station hall elevator arrangement structure comprises a station hall top plate, a station hall bottom plate, a station hall middle plate and two bearing walls. An elevator hole is formed in the station hall middle plate, the bearing walls penetrate through the station hall middle plate and are arranged between the station hall bottom plate and the station hall top plate, and the two bearing walls are oppositely arranged and are arranged on the two sides of the elevator hole. The problem that in the prior art, when a station hall elevator is arranged, occupied space is large is solved.
本发明涉及土木建筑工程技术领域,公开了一种站厅电梯布置结构,包括站厅顶板、站厅底板和站厅中板,还包括承重墙,所述站厅中板形成电梯孔洞,所述承重墙穿设所述站厅中板并设于所述站厅底板和站厅顶板之间,所述承重墙为相对设置的两个且设于所述电梯孔洞的两侧。本发明解决了现有技术在站厅电梯布置时所造成空间占用大的问题。
Station hall elevator arrangement structure
站厅电梯布置结构
TANG YALIN (author) / LEI ZHENYU (author) / ZHU MOFU (author) / YE KAILUN (author)
2021-07-23
Patent
Electronic Resource
Chinese
IPC:
E02D
FOUNDATIONS
,
Gründungen