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Low-temperature active brazing filler metal and method for brazing silicon carbide ceramics
The invention discloses low-temperature active brazing filler metal and a method for brazing silicon carbide ceramics. The brazing filler metal comprises the following chemical components in percentage by mass: 55-70% of In, 12-18% of Ag, 2-7% of Ti and the balance of Cu. The method for brazing the silicon carbide ceramics comprises the following steps: forming brazing filler metal films on to-be-welded surfaces of the silicon carbide ceramics by adopting a plasma sputtering process; and aligning the two silicon carbide ceramics with the brazing filler metal films, and then performing vacuum welding to obtain the silicon carbide ceramics after brazing connection. On the basis of effectively reducing the melting point of the brazing filler metal and the corresponding brazing temperature, the joint strength can be greatly improved.
本发明公开了一种低温活性钎料及钎焊碳化硅陶瓷的方法，所述钎料的化学成分按质量百分比计包括：In：55‑70％、Ag：12‑18％、Ti：2‑7％、余量为Cu；所述钎焊碳化硅陶瓷的方法，包括：采用等离子溅射工艺在碳化硅陶瓷的待焊接面上形成钎料薄膜；将两块具有钎料薄膜的碳化硅陶瓷对准，再真空焊接，得到钎焊连接后的碳化硅陶瓷。本发明在有效降低钎料熔点及相应钎焊温度的基础上，还能大幅度提高接头强度。
Low-temperature active brazing filler metal and method for brazing silicon carbide ceramics
The invention discloses low-temperature active brazing filler metal and a method for brazing silicon carbide ceramics. The brazing filler metal comprises the following chemical components in percentage by mass: 55-70% of In, 12-18% of Ag, 2-7% of Ti and the balance of Cu. The method for brazing the silicon carbide ceramics comprises the following steps: forming brazing filler metal films on to-be-welded surfaces of the silicon carbide ceramics by adopting a plasma sputtering process; and aligning the two silicon carbide ceramics with the brazing filler metal films, and then performing vacuum welding to obtain the silicon carbide ceramics after brazing connection. On the basis of effectively reducing the melting point of the brazing filler metal and the corresponding brazing temperature, the joint strength can be greatly improved.
本发明公开了一种低温活性钎料及钎焊碳化硅陶瓷的方法，所述钎料的化学成分按质量百分比计包括：In：55‑70％、Ag：12‑18％、Ti：2‑7％、余量为Cu；所述钎焊碳化硅陶瓷的方法，包括：采用等离子溅射工艺在碳化硅陶瓷的待焊接面上形成钎料薄膜；将两块具有钎料薄膜的碳化硅陶瓷对准，再真空焊接，得到钎焊连接后的碳化硅陶瓷。本发明在有效降低钎料熔点及相应钎焊温度的基础上，还能大幅度提高接头强度。
Low-temperature active brazing filler metal and method for brazing silicon carbide ceramics
一种低温活性钎料及钎焊碳化硅陶瓷的方法
JIN YING (author) / LIU PING (author) / ZHANG LINGLING (author) / JIN XIA (author) / ZHANG TENGHUI (author) / WENG ZIQING (author) / SHI JINGUANG (author)
2021-12-28
Patent
Electronic Resource
Chinese
BRAZING FILLER METAL BRAZING FILLER ALLOY PANNEL AND BRAZING METHOD
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