A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
SYSTEM FOR REMOVING PARTICLES FROM LIQUID
Embodiments of the present disclosure provide a system for removing particles from a liquid. The system may include a base 210, a tubular body 480 extending upwardly from the base, a liquid mass device 100 positioned above the base, a sump region 240 positioned between the base and the liquid mass device, and a plurality of resistance inducing portions 450 positioned in the sump region and projecting inwardly toward a central axis of the sump region. The tubular body may include an inlet and an outlet. The plurality of resistance inducing portions may include a first set of resistance inducing portions 450a, a second set of resistance inducing portions 450b, a third set of resistance inducing portions 450c, and a fourth set of resistance inducing portions. The first, second, third, and fourth sets of resistance inducing portions may be positioned equidistantly from one another and at the same height around the perimeter of the sump region.
本公开的实施例提供了一种用于从液体中去除颗粒的系统。该系统可包括基座210、从基座向上延伸的管状主体480、位于基座上方的液体质量装置100、位于基座和液体质量装置之间的贮槽区域240以及定位在贮槽区域中并朝向贮槽区域的中心轴线向内突出的多个阻力诱发部分450。管状主体可以包括入口和出口。多个阻力诱发部分可以包括第一组阻力诱发部分450a、第二组阻力诱发部分450b、第三组阻力诱发部分450c和第四组阻力诱发部分。第一组、第二组、第三组和第四组阻力诱发部分可以围绕贮槽区域的周边彼此等距地定位并且处于相同的高度。
SYSTEM FOR REMOVING PARTICLES FROM LIQUID
Embodiments of the present disclosure provide a system for removing particles from a liquid. The system may include a base 210, a tubular body 480 extending upwardly from the base, a liquid mass device 100 positioned above the base, a sump region 240 positioned between the base and the liquid mass device, and a plurality of resistance inducing portions 450 positioned in the sump region and projecting inwardly toward a central axis of the sump region. The tubular body may include an inlet and an outlet. The plurality of resistance inducing portions may include a first set of resistance inducing portions 450a, a second set of resistance inducing portions 450b, a third set of resistance inducing portions 450c, and a fourth set of resistance inducing portions. The first, second, third, and fourth sets of resistance inducing portions may be positioned equidistantly from one another and at the same height around the perimeter of the sump region.
本公开的实施例提供了一种用于从液体中去除颗粒的系统。该系统可包括基座210、从基座向上延伸的管状主体480、位于基座上方的液体质量装置100、位于基座和液体质量装置之间的贮槽区域240以及定位在贮槽区域中并朝向贮槽区域的中心轴线向内突出的多个阻力诱发部分450。管状主体可以包括入口和出口。多个阻力诱发部分可以包括第一组阻力诱发部分450a、第二组阻力诱发部分450b、第三组阻力诱发部分450c和第四组阻力诱发部分。第一组、第二组、第三组和第四组阻力诱发部分可以围绕贮槽区域的周边彼此等距地定位并且处于相同的高度。
SYSTEM FOR REMOVING PARTICLES FROM LIQUID
用于从液体中去除颗粒的系统
HARTWELL EDWARD K (author) / LIU BO (author) / FIGURA DANIEL J (author)
2023-08-08
Patent
Electronic Resource
Chinese
IPC:
E03F
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