A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
Self-cleaning coating, self-cleaning structure, manufacturing method, glass curtain wall and monitoring equipment
The invention discloses a self-cleaning coating, a self-cleaning structure, a manufacturing method, a glass curtain wall and monitoring equipment. The rubber column array layer is arranged on the surface of at least one side of the conductive layer, the rubber column array layer comprises a plurality of nano rubber columns, and one end of each nano rubber column is connected with the conductive layer; wherein the side face of each nanometer glue column is provided with at least one electrically-induced deformation structural part, and the at least one electrically-induced deformation structural part of each nanometer glue column and the conductive layer are arranged in a spaced mode. According to the self-cleaning coating, the conductive layer is arranged on the surface of the substrate, so that the conductivity of the surface of the substrate is guaranteed, the rubber column array layer is arranged on the surface of the conductive layer, each nano rubber column of the rubber column array layer is provided with at least one electrically-induced deformation structural part, and the at least one electrically-induced deformation structural part and the conductive layer are arranged at intervals; the electrically-induced deformation structural member is deformed under the action of the alternating electric field, so that the rubber column array layer vibrates, and mechanical active dust removal is realized.
本申请公开一种自清洁涂层、自清洁结构、制作方法、玻璃幕墙及监控设备，该自清洁涂层包括：导电层；胶柱阵列层，设于导电层的至少一侧表面，胶柱阵列层包括多个纳米胶柱，每个纳米胶柱的一端与导电层连接；其中，每个纳米胶柱的侧面设有至少一个电致变形结构件，每个纳米胶柱的至少一个电致变形结构件与导电层间隔设置。本申请的自清洁涂层通过在基底表面设置导电层，以保证基底表面的导电性，并在导电层的表面设置胶柱阵列层，胶柱阵列层的每个纳米胶柱上设置至少一个电致变形结构件，且至少一个电致变形结构件与导电层间隔设置，以使电致变形结构件在交变电场作用下产生变形，从而使胶柱阵列层进行振动，实现机械主动除尘。
Self-cleaning coating, self-cleaning structure, manufacturing method, glass curtain wall and monitoring equipment
The invention discloses a self-cleaning coating, a self-cleaning structure, a manufacturing method, a glass curtain wall and monitoring equipment. The rubber column array layer is arranged on the surface of at least one side of the conductive layer, the rubber column array layer comprises a plurality of nano rubber columns, and one end of each nano rubber column is connected with the conductive layer; wherein the side face of each nanometer glue column is provided with at least one electrically-induced deformation structural part, and the at least one electrically-induced deformation structural part of each nanometer glue column and the conductive layer are arranged in a spaced mode. According to the self-cleaning coating, the conductive layer is arranged on the surface of the substrate, so that the conductivity of the surface of the substrate is guaranteed, the rubber column array layer is arranged on the surface of the conductive layer, each nano rubber column of the rubber column array layer is provided with at least one electrically-induced deformation structural part, and the at least one electrically-induced deformation structural part and the conductive layer are arranged at intervals; the electrically-induced deformation structural member is deformed under the action of the alternating electric field, so that the rubber column array layer vibrates, and mechanical active dust removal is realized.
本申请公开一种自清洁涂层、自清洁结构、制作方法、玻璃幕墙及监控设备，该自清洁涂层包括：导电层；胶柱阵列层，设于导电层的至少一侧表面，胶柱阵列层包括多个纳米胶柱，每个纳米胶柱的一端与导电层连接；其中，每个纳米胶柱的侧面设有至少一个电致变形结构件，每个纳米胶柱的至少一个电致变形结构件与导电层间隔设置。本申请的自清洁涂层通过在基底表面设置导电层，以保证基底表面的导电性，并在导电层的表面设置胶柱阵列层，胶柱阵列层的每个纳米胶柱上设置至少一个电致变形结构件，且至少一个电致变形结构件与导电层间隔设置，以使电致变形结构件在交变电场作用下产生变形，从而使胶柱阵列层进行振动，实现机械主动除尘。
Self-cleaning coating, self-cleaning structure, manufacturing method, glass curtain wall and monitoring equipment
一种自清洁涂层、自清洁结构、制作方法、玻璃幕墙及监控设备
ZHENG BODA (author) / XU QIONGHUA (author) / WANG CONG (author) / CHEN JIE (author) / GAO CHUNSHAN (author) / ZHENG DONGHUI (author) / YOO JEONG-HEE (author) / CHEN HONGWU (author) / DENG ZHIJI (author) / WANG YALI (author)
2024-04-02
Patent
Electronic Resource
Chinese
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