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ACCOMMODATING CONTAINER AND WAFER STOCKER USING SAME
Provided is a wafer stocker that can prevent the inflow of an external atmosphere, maintain a wafer storage space at a desired atmosphere with a relatively small amount of gas, and prevent dust from being attached to a wafer surface. A shutter portion, including multiple shield plates having the same height as an interval between shelf plates disposed in a storage container, is disposed with a slight space from a body portion, and by supplying clean gas into the storage container, a clean atmosphere of a higher pressure than an external environment is maintained, and a shutter portion is opened and closed by moving up and down the shield plate independently from the shelf plate that supports a wafer.
ACCOMMODATING CONTAINER AND WAFER STOCKER USING SAME
Provided is a wafer stocker that can prevent the inflow of an external atmosphere, maintain a wafer storage space at a desired atmosphere with a relatively small amount of gas, and prevent dust from being attached to a wafer surface. A shutter portion, including multiple shield plates having the same height as an interval between shelf plates disposed in a storage container, is disposed with a slight space from a body portion, and by supplying clean gas into the storage container, a clean atmosphere of a higher pressure than an external environment is maintained, and a shutter portion is opened and closed by moving up and down the shield plate independently from the shelf plate that supports a wafer.
ACCOMMODATING CONTAINER AND WAFER STOCKER USING SAME
AUFNAHMEBEHÄLTER UND WAFER-STOCKER DAMIT
RÉCIPIENT DE CONTENANCE ET DISPOSITIF DE STOCKAGE DE PLAQUETTES L'UTILISANT
SAKIYA FUMIO (author) / SAKATA KATSUNORI (author)
2021-03-31
Patent
Electronic Resource
English