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GAS DISTRIBUTION FOR CHEMICAL VAPOR DEPOSITION/INFILTRATION
A system of manufacturing a ceramic matrix composite component, the system comprising: a chamber (310) comprising an inlet portion (312) and an outlet portion (313), wherein the inlet portion is configured to house a porous preform (315); a first inlet (320) for introducing a gaseous precursor into the inlet portion of the chamber; a gas distribution plate (500) disposed between the inlet portion and the outlet portion of the chamber; a second inlet (330) for introducing a gaseous mitigation agent into an internal cavity defined in the gas distribution plate, wherein the gas distribution plate facilitates mixing the gaseous mitigation agent with a reaction gas from the inlet portion of the chamber; and an exhaust conduit (340) coupled in fluidic communication with the outlet portion of the chamber.
GAS DISTRIBUTION FOR CHEMICAL VAPOR DEPOSITION/INFILTRATION
A system of manufacturing a ceramic matrix composite component, the system comprising: a chamber (310) comprising an inlet portion (312) and an outlet portion (313), wherein the inlet portion is configured to house a porous preform (315); a first inlet (320) for introducing a gaseous precursor into the inlet portion of the chamber; a gas distribution plate (500) disposed between the inlet portion and the outlet portion of the chamber; a second inlet (330) for introducing a gaseous mitigation agent into an internal cavity defined in the gas distribution plate, wherein the gas distribution plate facilitates mixing the gaseous mitigation agent with a reaction gas from the inlet portion of the chamber; and an exhaust conduit (340) coupled in fluidic communication with the outlet portion of the chamber.
GAS DISTRIBUTION FOR CHEMICAL VAPOR DEPOSITION/INFILTRATION
GASVERTEILUNG FÜR CHEMISCHE DAMPFABSCHEIDUNG/-INFILTRATION
DISTRIBUTION DE GAZ POUR DÉPÔT/INFILTRATION CHIMIQUE EN PHASE VAPEUR
MENON NAVEEN G (author) / SHE YING (author) / DARDAS ZISSIS A (author) / FILBURN THOMAS P (author) / CAI XIAODAN (author)
2022-04-27
Patent
Electronic Resource
English
GAS DISTRIBUTION FOR CHEMICAL VAPOR DEPOSITION/INFILTRATION
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