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A platform for research: civil engineering, architecture and urbanism
SPACER FOR DISCHARGE PLASMA SINTERING, DISCHARGE PLASMA SINTERING DEVICE, AND DISCHARGE PLASMA SINTERING METHOD
PROBLEM TO BE SOLVED: To provide a silicon carbide spacer capable of stably conducting discharge plasma sintering by suppressing generation of breakage by the discharge plasma sintering.SOLUTION: The spacer for discharge plasma sintering is a silicon carbide spacer 12 containing silicon carbide and having a circular truncated cone shape. The silicon carbide spacer 12 is arranged between a punch 112 of a molding tool for discharge plasma sintering 11 having a cylinder 111 and the punch 112, and a compression ram 14 for applying pressure to the punch 112 in a discharge plasma sintering device 1 and is used with having a small flat surface 21 with a circular truncated cone shape arranged in a punch 112 side. Diameter of the small flat surface 21 (d) is constituted to satisfy a relationship of 1≤d/a<1.5 by a ratio with diameter of the punch 112 (a).SELECTED DRAWING: Figure 2
【課題】放電プラズマ焼結による破壊の発生を抑制して、その放電プラズマ焼結を安定的に行うことを可能にする炭化ケイ素スペーサーを提供する。【解決手段】本発明に係る放電プラズマ焼結用スペーサーは、炭化ケイ素を含み、円錐台形状を有する炭化ケイ素スペーサー１２である。この炭化ケイ素スペーサー１２は、放電プラズマ焼結装置１において、シリンダー１１１と、パンチ１１２とを備える放電プラズマ焼結用成形型１１のそのパンチ１１２と、パンチ１１２に圧力を印加する加圧ラム１４との間に設置され、円錐台形状の小平面部２１がパンチ１１２側に配置されて用いられる。また、小平面部２１の直径（ｄｓ）は、パンチ１１２の直径（ａ）との比で、１≦ｄｓ／ａ＜１．５の関係を満たすように構成されることが好ましい。【選択図】図２
SPACER FOR DISCHARGE PLASMA SINTERING, DISCHARGE PLASMA SINTERING DEVICE, AND DISCHARGE PLASMA SINTERING METHOD
PROBLEM TO BE SOLVED: To provide a silicon carbide spacer capable of stably conducting discharge plasma sintering by suppressing generation of breakage by the discharge plasma sintering.SOLUTION: The spacer for discharge plasma sintering is a silicon carbide spacer 12 containing silicon carbide and having a circular truncated cone shape. The silicon carbide spacer 12 is arranged between a punch 112 of a molding tool for discharge plasma sintering 11 having a cylinder 111 and the punch 112, and a compression ram 14 for applying pressure to the punch 112 in a discharge plasma sintering device 1 and is used with having a small flat surface 21 with a circular truncated cone shape arranged in a punch 112 side. Diameter of the small flat surface 21 (d) is constituted to satisfy a relationship of 1≤d/a<1.5 by a ratio with diameter of the punch 112 (a).SELECTED DRAWING: Figure 2
【課題】放電プラズマ焼結による破壊の発生を抑制して、その放電プラズマ焼結を安定的に行うことを可能にする炭化ケイ素スペーサーを提供する。【解決手段】本発明に係る放電プラズマ焼結用スペーサーは、炭化ケイ素を含み、円錐台形状を有する炭化ケイ素スペーサー１２である。この炭化ケイ素スペーサー１２は、放電プラズマ焼結装置１において、シリンダー１１１と、パンチ１１２とを備える放電プラズマ焼結用成形型１１のそのパンチ１１２と、パンチ１１２に圧力を印加する加圧ラム１４との間に設置され、円錐台形状の小平面部２１がパンチ１１２側に配置されて用いられる。また、小平面部２１の直径（ｄｓ）は、パンチ１１２の直径（ａ）との比で、１≦ｄｓ／ａ＜１．５の関係を満たすように構成されることが好ましい。【選択図】図２
SPACER FOR DISCHARGE PLASMA SINTERING, DISCHARGE PLASMA SINTERING DEVICE, AND DISCHARGE PLASMA SINTERING METHOD
放電プラズマ焼結用スペーサー、放電プラズマ焼結装置、及び放電プラズマ焼結方法
KAKEGAWA KAZUYUKI (author) / NAKAMURA NOBUO (author)
2018-01-18
Patent
Electronic Resource
Japanese
IPC:
C04B
Kalk
,
LIME
/
B22F
Verarbeiten von Metallpulver
,
WORKING METALLIC POWDER
/
B28B
Formgeben von Ton oder anderen keramischen Stoffzusammensetzungen, Schlacke oder von Mischungen, die zementartiges Material enthalten, z.B. Putzmörtel
,
SHAPING CLAY OR OTHER CERAMIC COMPOSITIONS, SLAG OR MIXTURES CONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER
DISCHARGE PLASMA SINTERING DEVICE AND CONTINUOUS TYPE DISCHARGE PLASMA SINTERING DEVICE
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SPACER FOR SPARK PLASMA SINTERING, SPARK PLASMA SINTERING DEVICE, AND SPARK PLASMA SINTERING METHOD
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Powder Characteristic of Plasma Sintering by Hollow Cathod Discharge
| British Library Online Contents | 2000
Research and Development of Novel Materials by Plasma Discharge Sintering Process
| British Library Online Contents | 1995
Research and Development of Novel Materials by Plasma Discharge Sintering Process
| British Library Online Contents | 1995