A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
PROBLEM TO BE SOLVED: To provide a high pressure indoor suction device capable of obtaining a suction force without setting a vacuum pressure in a suction pad.SOLUTION: In a work chamber 2 kept at the pressure higher than the atmospheric pressure, a suction pad 63 is brought into contact with a ceiling surface 5 to form a pad inner space 65. The atmospheric pressure on the ground is introduced into the pad inner space 65 via an atmospheric pressure introduction hose H1 and a ventilation path R1. A suction force can be obtained due to the pressure difference by generating a state in which the pressure in the pad inner space 65 is lower than that in the work chamber 2.SELECTED DRAWING: Figure 3
【課題】吸着パッド内を真空圧に設定することなく吸着力を得ることが可能な高気圧室内吸着装置を提供する。【解決手段】大気圧よりも高い気圧状態に保たれた作業室２内において、吸着パッド６３は天井面５に当接されてパッド内空間６５を形成する。大気圧導入ホースＨ１および通気路Ｒ１を介して地上の大気圧をパッド内空間６５に導き、作業室２内よりもパッド内空間６５の方が気圧が低い状態を生じさせ、その気圧差により吸着力を得る構成とする。【選択図】図３
PROBLEM TO BE SOLVED: To provide a high pressure indoor suction device capable of obtaining a suction force without setting a vacuum pressure in a suction pad.SOLUTION: In a work chamber 2 kept at the pressure higher than the atmospheric pressure, a suction pad 63 is brought into contact with a ceiling surface 5 to form a pad inner space 65. The atmospheric pressure on the ground is introduced into the pad inner space 65 via an atmospheric pressure introduction hose H1 and a ventilation path R1. A suction force can be obtained due to the pressure difference by generating a state in which the pressure in the pad inner space 65 is lower than that in the work chamber 2.SELECTED DRAWING: Figure 3
【課題】吸着パッド内を真空圧に設定することなく吸着力を得ることが可能な高気圧室内吸着装置を提供する。【解決手段】大気圧よりも高い気圧状態に保たれた作業室２内において、吸着パッド６３は天井面５に当接されてパッド内空間６５を形成する。大気圧導入ホースＨ１および通気路Ｒ１を介して地上の大気圧をパッド内空間６５に導き、作業室２内よりもパッド内空間６５の方が気圧が低い状態を生じさせ、その気圧差により吸着力を得る構成とする。【選択図】図３
HIGH PRESSURE INDOOR SUCTION DEVICE
高気圧室内吸着装置
FUKUDA JUNJI (author)
2018-05-31
Patent
Electronic Resource
Japanese
IPC:
E02D
FOUNDATIONS
,
Gründungen
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