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SILICON NITRIDE MATERIAL PROCESSING METHOD
To provide a silicon nitride material processing method with high processing speed.SOLUTION: A silicon nitride material processing method includes a surface processing step of processing the surface of a silicon nitride material with processing tool under use of processing fluid, and the processing fluid contains one or more components selected from CO, CO, and HCO, and the concentration of dissolved CO 2 in the processing fluid is 1.49 mg/L or more.SELECTED DRAWING: None
【課題】加工速度が速い窒化珪素材の加工方法を提供する。【解決手段】窒化珪素材の表面を加工液の使用下で加工工具により加工する表面加工工程を備え、前記加工液は、CO2、CO32−、及びHCO3−から選択される1つ以上の成分を含み、前記加工液の溶存CO2濃度が1.49mg/L以上である窒化珪素材の加工方法。【選択図】なし
SILICON NITRIDE MATERIAL PROCESSING METHOD
To provide a silicon nitride material processing method with high processing speed.SOLUTION: A silicon nitride material processing method includes a surface processing step of processing the surface of a silicon nitride material with processing tool under use of processing fluid, and the processing fluid contains one or more components selected from CO, CO, and HCO, and the concentration of dissolved CO 2 in the processing fluid is 1.49 mg/L or more.SELECTED DRAWING: None
【課題】加工速度が速い窒化珪素材の加工方法を提供する。【解決手段】窒化珪素材の表面を加工液の使用下で加工工具により加工する表面加工工程を備え、前記加工液は、CO2、CO32−、及びHCO3−から選択される1つ以上の成分を含み、前記加工液の溶存CO2濃度が1.49mg/L以上である窒化珪素材の加工方法。【選択図】なし
SILICON NITRIDE MATERIAL PROCESSING METHOD
窒化珪素材の加工方法
OKUNI HIDEYUKI (author) / NAGASAWA MOTOKI (author) / AWATA HIDEAKI (author)
2019-03-07
Patent
Electronic Resource
Japanese
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