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METHOD OF PRODUCING CRYSTALLINE OXIDE CERAMIC BY CALCINATION IN SHORT TIME, AND DEVICE THEREFOR
To provide a method of producing crystalline oxide ceramic by calcination in a short time, and a device for carrying out the method.SOLUTION: The method of producing crystalline oxide ceramic by calcination in a short time, comprises a step S1 of mixing an oxide and/or a carbonate, and/or a phosphate of an element other than oxygen contained in crystalline oxide ceramic to obtain a mixture thereof, a step S2 of molding the powder mixture to produce a molding, a preliminary calcination step S3 of carrying out preliminary calcination of the molding obtained, and a main calcination step S4 of calcining the molding under a pressurized gas atmosphere at an absolute pressure of 0.33 to 0.38 MPa using compressed air, at a main calcination temperature of 1000 to 1100°C until the mean grain diameter of the crystal grains reaches 2 to 5 μm, with the time necessary for the main calcination step S4 being not longer than one fourth of that of the main calcination step S4 carried out under the atmosphere. A production device for carrying out the method is also disclosed.SELECTED DRAWING: Figure 14
【課題】結晶質酸化物セラミックスを短時間で焼成する製法と、その製法を実施するための装置の提供。【解決手段】結晶質酸化物セラミックスに含まれる酸素以外の元素の、酸化物、及び／又は炭酸塩、及び／又はリン酸塩の粉末を混合した混合粉末Ｓ１を成形Ｓ２して、得られた成形体を仮焼成する仮焼成工程Ｓ３と、圧縮空気を用い、絶対圧が０．３３〜０．３８ＭＰａの加圧ガス雰囲気下で、１０００〜１１００℃の本焼成温度で、結晶粒の平均粒径が２〜５μｍに到達するまで焼成する本焼成工程Ｓ４を含み、本焼成工程Ｓ４を大気雰囲気下で行う場合に比べて、本焼成工程Ｓ４に要する時間が４分の１以下である結晶質酸化物セラミックス短時間焼成製法と、その製法を実施するための製造装置。【選択図】図１４
METHOD OF PRODUCING CRYSTALLINE OXIDE CERAMIC BY CALCINATION IN SHORT TIME, AND DEVICE THEREFOR
To provide a method of producing crystalline oxide ceramic by calcination in a short time, and a device for carrying out the method.SOLUTION: The method of producing crystalline oxide ceramic by calcination in a short time, comprises a step S1 of mixing an oxide and/or a carbonate, and/or a phosphate of an element other than oxygen contained in crystalline oxide ceramic to obtain a mixture thereof, a step S2 of molding the powder mixture to produce a molding, a preliminary calcination step S3 of carrying out preliminary calcination of the molding obtained, and a main calcination step S4 of calcining the molding under a pressurized gas atmosphere at an absolute pressure of 0.33 to 0.38 MPa using compressed air, at a main calcination temperature of 1000 to 1100°C until the mean grain diameter of the crystal grains reaches 2 to 5 μm, with the time necessary for the main calcination step S4 being not longer than one fourth of that of the main calcination step S4 carried out under the atmosphere. A production device for carrying out the method is also disclosed.SELECTED DRAWING: Figure 14
【課題】結晶質酸化物セラミックスを短時間で焼成する製法と、その製法を実施するための装置の提供。【解決手段】結晶質酸化物セラミックスに含まれる酸素以外の元素の、酸化物、及び／又は炭酸塩、及び／又はリン酸塩の粉末を混合した混合粉末Ｓ１を成形Ｓ２して、得られた成形体を仮焼成する仮焼成工程Ｓ３と、圧縮空気を用い、絶対圧が０．３３〜０．３８ＭＰａの加圧ガス雰囲気下で、１０００〜１１００℃の本焼成温度で、結晶粒の平均粒径が２〜５μｍに到達するまで焼成する本焼成工程Ｓ４を含み、本焼成工程Ｓ４を大気雰囲気下で行う場合に比べて、本焼成工程Ｓ４に要する時間が４分の１以下である結晶質酸化物セラミックス短時間焼成製法と、その製法を実施するための製造装置。【選択図】図１４
METHOD OF PRODUCING CRYSTALLINE OXIDE CERAMIC BY CALCINATION IN SHORT TIME, AND DEVICE THEREFOR
結晶質酸化物セラミックス短時間焼成製法及び装置
NAKANO HIROMI (author) / FURUTA YOSHIO (author)
2019-07-04
Patent
Electronic Resource
Japanese
IPC:
C04B
Kalk
,
LIME
/
C01G
Verbindungen der von den Unterklassen C01D oder C01F nicht umfassten Metalle
,
COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
/
C09K
Materialien für Anwendungen, soweit nicht anderweitig vorgesehen
,
MATERIALS FOR APPLICATIONS NOT OTHERWISE PROVIDED FOR
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