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VALVE DEVICE AND PIPING STRUCTURE
To provide a valve device having a more simple structure, and being more simplified in maintenance of a valve element.SOLUTION: A valve device 100 includes: a device main body 110 composed of a cylindrical peripheral wall 111, and including an upstream-side opening end 112 formed on one end of the peripheral wall 111, a downstream-side opening end 113 formed on the other end of the peripheral wall 111, a fluid flow channel formed between the upstream-side opening end 112 and the downstream-side opening end 113, a valve seat 114 disposed on the way of the flow channel inside of the peripheral wall 111, and an opening portion 117 formed on the peripheral wall 111 in a manner of exposing the flow channel to the external; a cover body 150 detachably closing the opening portion 117; a valve element 130 disposed on the flow channel inside of the peripheral wall 111 and displaced to a closing position and an opening position; and energization means for energizing the valve element 130 to the valve seat 114. The energization means comprises a main body-side operation portion 121 disposed on the device main body 110, and a valve element-side operation portion 133 disposed on the valve element 130, and the valve element 130 is energized to the valve seat 114 by magnetic attraction force or magnetic repulsion force generating between the main body-side operation portion 121 and the valve element-side operation portion 133.SELECTED DRAWING: Figure 4
【課題】より簡素な構造を有し、弁体のメンテナンスをより簡易化した弁装置を提供する。【解決手段】弁装置100は、筒状の周壁111からなり、周壁111の一端に形成された上流側開口端112、周壁111の他端に形成された下流側開口端113、上流側開口端112と下流側開口端113との間に形成された流体の流路、周壁111内部の流路の途中に配置された弁座114、及び、流路を外部に露出させるように周壁111に形成された開口部117を備える装置本体110と、開口部117を着脱自在に閉塞する蓋体150と、周壁111内部の流路上に配置され、閉鎖位置と開放位置とに変位する弁体130と、弁体130を弁座114に付勢する付勢手段とを備える。付勢手段は、装置本体110に配置された本体側作用部121及び弁体130に配置された弁体側作用部133からなり、本体側作用部121と弁体側作用部133の間に発生する磁気的引力又は磁気的斥力によって、弁体130が弁座114に付勢される。【選択図】図4
VALVE DEVICE AND PIPING STRUCTURE
To provide a valve device having a more simple structure, and being more simplified in maintenance of a valve element.SOLUTION: A valve device 100 includes: a device main body 110 composed of a cylindrical peripheral wall 111, and including an upstream-side opening end 112 formed on one end of the peripheral wall 111, a downstream-side opening end 113 formed on the other end of the peripheral wall 111, a fluid flow channel formed between the upstream-side opening end 112 and the downstream-side opening end 113, a valve seat 114 disposed on the way of the flow channel inside of the peripheral wall 111, and an opening portion 117 formed on the peripheral wall 111 in a manner of exposing the flow channel to the external; a cover body 150 detachably closing the opening portion 117; a valve element 130 disposed on the flow channel inside of the peripheral wall 111 and displaced to a closing position and an opening position; and energization means for energizing the valve element 130 to the valve seat 114. The energization means comprises a main body-side operation portion 121 disposed on the device main body 110, and a valve element-side operation portion 133 disposed on the valve element 130, and the valve element 130 is energized to the valve seat 114 by magnetic attraction force or magnetic repulsion force generating between the main body-side operation portion 121 and the valve element-side operation portion 133.SELECTED DRAWING: Figure 4
【課題】より簡素な構造を有し、弁体のメンテナンスをより簡易化した弁装置を提供する。【解決手段】弁装置100は、筒状の周壁111からなり、周壁111の一端に形成された上流側開口端112、周壁111の他端に形成された下流側開口端113、上流側開口端112と下流側開口端113との間に形成された流体の流路、周壁111内部の流路の途中に配置された弁座114、及び、流路を外部に露出させるように周壁111に形成された開口部117を備える装置本体110と、開口部117を着脱自在に閉塞する蓋体150と、周壁111内部の流路上に配置され、閉鎖位置と開放位置とに変位する弁体130と、弁体130を弁座114に付勢する付勢手段とを備える。付勢手段は、装置本体110に配置された本体側作用部121及び弁体130に配置された弁体側作用部133からなり、本体側作用部121と弁体側作用部133の間に発生する磁気的引力又は磁気的斥力によって、弁体130が弁座114に付勢される。【選択図】図4
VALVE DEVICE AND PIPING STRUCTURE
弁装置及び配管構造
MATSUDA SHOHEI (author) / KAWAMURA YUICHI (author)
2020-12-10
Patent
Electronic Resource
Japanese