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SLOPE REINFORCEMENT STRUCTURE
To provide a slope reinforcement structure capable of draining rainwater along a slope by a drainage layer and suppressing permeation of rainwater below the slope by an impermeable layer.SOLUTION: A slope reinforcement structure 10 comprises a compartment 40 arranged on a slope 100A to partition the slope 100A, and a laminated sheet 50 having at least two layers of a drainage layer 52 and an impermeable layer 54 superposed on the drainage layer 52, and arranged between the slope 100A and the compartment 40 with the drainage layer 52 of the two layers facing the compartment 40 side.SELECTED DRAWING: Figure 2
【課題】本発明は、排水層により雨水を法面に沿って排水させつつ、遮水層により雨水の法面下への浸透を抑制することができる法面補強構造の提供を目的とする。【解決手段】法面補強構造10は、法面100A上に配置され法面100A上に配置され法面100Aを区画する区画部40と、少なくとも排水層52及び排水層52に重ねられている遮水層54の2層を有し、前記2層のうち排水層52を区画部40側に向けた状態で、法面100Aと区画部40との間に配置している積層シート50と、を備える。【選択図】図2
SLOPE REINFORCEMENT STRUCTURE
To provide a slope reinforcement structure capable of draining rainwater along a slope by a drainage layer and suppressing permeation of rainwater below the slope by an impermeable layer.SOLUTION: A slope reinforcement structure 10 comprises a compartment 40 arranged on a slope 100A to partition the slope 100A, and a laminated sheet 50 having at least two layers of a drainage layer 52 and an impermeable layer 54 superposed on the drainage layer 52, and arranged between the slope 100A and the compartment 40 with the drainage layer 52 of the two layers facing the compartment 40 side.SELECTED DRAWING: Figure 2
【課題】本発明は、排水層により雨水を法面に沿って排水させつつ、遮水層により雨水の法面下への浸透を抑制することができる法面補強構造の提供を目的とする。【解決手段】法面補強構造10は、法面100A上に配置され法面100A上に配置され法面100Aを区画する区画部40と、少なくとも排水層52及び排水層52に重ねられている遮水層54の2層を有し、前記2層のうち排水層52を区画部40側に向けた状態で、法面100Aと区画部40との間に配置している積層シート50と、を備える。【選択図】図2
SLOPE REINFORCEMENT STRUCTURE
法面補強構造
KOJIMA KENICHI (author) / ISHIGAKI RYUICHI (author) / HARADA MICHIYUKI (author) / YAZAKI SUMIO (author) / OKAMOTO MASAHIRO (author) / YAMADA TAKAHIRO (author) / SAKAMOTO HIROAKI (author) / KONDO MASAHIRO (author) / FUJII KIMIHIRO (author)
2021-08-02
Patent
Electronic Resource
Japanese
IPC:
E02D
FOUNDATIONS
,
Gründungen
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