A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
PRIVATE PARTS WASHING DEVICE
To provide a private parts washing device whose control unit has a compact structure, and which prevents splashing of washing water to a part applied with a high voltage.SOLUTION: A control unit of a private parts washing device comprises: a high voltage substrate for supplying a high voltage to objects requiring the high voltage among units such as a nozzle unit and a heater unit; a low voltage substrate for supplying a low voltage to objects requiring the low voltage lower than the high voltage; a first storage case having a peripheral wall having an opening at an upper part and storing the high voltage substrate; and a second storage case having a peripheral wall having an opening at an upper part and storing the low voltage substrate. The second storage case is overlappingly arranged on an upper end face of the peripheral wall of the first storage case so as to close the opening of the first storage case, and is provided with: a cutout part formed to the peripheral wall in a cutout state to be partly lower; and a drain ditch extended downward from a mating surface of the first storage case and the second storage case and draining water discharged from the cutout part downward.SELECTED DRAWING: Figure 5
【課題】局部洗浄装置の制御ユニットをコンパクトな構成としつつ、高電圧が印加される部分に洗浄水がかかるのを防止する。【解決手段】局部洗浄装置の制御ユニットは、ノズルユニットやヒータユニットなどの各ユニットのうち高電圧が必要な対象に高電圧を供給する高圧基板と、高電圧よりも低い低電圧が必要な対象に低電圧を供給する低圧基板と、上部に開口を形成する周壁を有し高圧基板を収容する第１収容ケースと、上部に開口を形成する周壁を有し低圧基板を収容する第２収容ケースと、を備え、第２収容ケースは、第１収容ケースの開口を塞ぐように第１収容ケースの周壁の上端面に重ね合わせて配置されており、周壁に高さが部分的に低くなるように切り欠き状に形成された切欠部と、第１収容ケースと第２収容ケースとの合わせ面よりも下方に延在し切欠部から排出された水を下方へ流す排水溝とが設けられている。【選択図】図５
PRIVATE PARTS WASHING DEVICE
To provide a private parts washing device whose control unit has a compact structure, and which prevents splashing of washing water to a part applied with a high voltage.SOLUTION: A control unit of a private parts washing device comprises: a high voltage substrate for supplying a high voltage to objects requiring the high voltage among units such as a nozzle unit and a heater unit; a low voltage substrate for supplying a low voltage to objects requiring the low voltage lower than the high voltage; a first storage case having a peripheral wall having an opening at an upper part and storing the high voltage substrate; and a second storage case having a peripheral wall having an opening at an upper part and storing the low voltage substrate. The second storage case is overlappingly arranged on an upper end face of the peripheral wall of the first storage case so as to close the opening of the first storage case, and is provided with: a cutout part formed to the peripheral wall in a cutout state to be partly lower; and a drain ditch extended downward from a mating surface of the first storage case and the second storage case and draining water discharged from the cutout part downward.SELECTED DRAWING: Figure 5
【課題】局部洗浄装置の制御ユニットをコンパクトな構成としつつ、高電圧が印加される部分に洗浄水がかかるのを防止する。【解決手段】局部洗浄装置の制御ユニットは、ノズルユニットやヒータユニットなどの各ユニットのうち高電圧が必要な対象に高電圧を供給する高圧基板と、高電圧よりも低い低電圧が必要な対象に低電圧を供給する低圧基板と、上部に開口を形成する周壁を有し高圧基板を収容する第１収容ケースと、上部に開口を形成する周壁を有し低圧基板を収容する第２収容ケースと、を備え、第２収容ケースは、第１収容ケースの開口を塞ぐように第１収容ケースの周壁の上端面に重ね合わせて配置されており、周壁に高さが部分的に低くなるように切り欠き状に形成された切欠部と、第１収容ケースと第２収容ケースとの合わせ面よりも下方に延在し切欠部から排出された水を下方へ流す排水溝とが設けられている。【選択図】図５
PRIVATE PARTS WASHING DEVICE
局部洗浄装置
KATAYAMA TORU (author) / SUMIYA KOSUKE (author)
2022-05-02
Patent
Electronic Resource
Japanese
IPC:
E03D
WATER-CLOSETS OR URINALS WITH FLUSHING DEVICES
,
Wasserklosetts oder Urinale mit Spülvorrichtungen