A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
RETAINER
To provide a retainer that solve a problem of an overheat under a high plasma environment and a problem caused by a difference of a thermal expansion coefficient between a plate-like member and a base part, and suppresses a deterioration of a processability of the base part.SOLUTION: A retainer for holding an object, comprises: a plate-like member formed in a plate like; and a base part that is bonded to the plate-like member, and is constructed by an ultra hard alloy, in which a value of a saturation magnetization in a room temperature is 5×10-7 Tm3/kg or less, and a difference of a means linear thermal expansion coefficient from -70°C to 200°C with the plate-like member is 1 ppm/K or less.SELECTED DRAWING: Figure 1
【課題】保持装置において、高プラズマ環境下における過熱の問題や、板状部材とベース部との間の熱膨張係数の差に起因する問題を抑えつつ、ベース部の加工性の低下を抑える。【解決手段】対象物を保持する保持装置は、板状に形成された板状部材と、板状部材に接合されて、超硬合金によって構成され、室温における飽和磁化の値が５×１０－７Ｔｍ３／ｋｇ以下であり、板状部材との－７０℃から２００℃における平均線熱膨張係数の差が１ｐｐｍ／Ｋ以下であるベース部と、を備える。【選択図】図１
RETAINER
To provide a retainer that solve a problem of an overheat under a high plasma environment and a problem caused by a difference of a thermal expansion coefficient between a plate-like member and a base part, and suppresses a deterioration of a processability of the base part.SOLUTION: A retainer for holding an object, comprises: a plate-like member formed in a plate like; and a base part that is bonded to the plate-like member, and is constructed by an ultra hard alloy, in which a value of a saturation magnetization in a room temperature is 5×10-7 Tm3/kg or less, and a difference of a means linear thermal expansion coefficient from -70°C to 200°C with the plate-like member is 1 ppm/K or less.SELECTED DRAWING: Figure 1
【課題】保持装置において、高プラズマ環境下における過熱の問題や、板状部材とベース部との間の熱膨張係数の差に起因する問題を抑えつつ、ベース部の加工性の低下を抑える。【解決手段】対象物を保持する保持装置は、板状に形成された板状部材と、板状部材に接合されて、超硬合金によって構成され、室温における飽和磁化の値が５×１０－７Ｔｍ３／ｋｇ以下であり、板状部材との－７０℃から２００℃における平均線熱膨張係数の差が１ｐｐｍ／Ｋ以下であるベース部と、を備える。【選択図】図１
RETAINER
保持装置
IIDA YUTA (author) / MOGI JUN (author) / MIYATA EIJI (author) / OGAWA TAKAMICHI (author)
2024-01-09
Patent
Electronic Resource
Japanese