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To provide an embankment construction structure that can withstand embankment load for a long time.SOLUTION: An embankment construction structure includes a drainage layer 3 formed on a surface layer 2 of a natural ground 1, an embankment construction part 4 formed on the drainage layer 3, drainage pipes 5 that are buried in the embankment construction part 4 and connected to the drainage layer 3, gravity retaining walls 6 installed in close contact with a supporting ground 1A of the natural ground 1, and a backfill part 7 that is formed on the mountain side of the gravity retaining walls 6 by porous expanded glass material with independent gaps with a specific gravity of 0.3 to 0.5, and that is connected to the drainage layer 3.SELECTED DRAWING: Figure 1
【課題】盛土荷重に長期間耐えることが可能な盛土造成構造の提供。【解決手段】地山1の表層部2に形成された排水層3と、排水層3上に形成された盛土造成部4と、盛土造成部4に埋設され、排水層3に接続された排水管5と、地山1の支持地盤1Aに密着させて設置された重力式擁壁6と、重力式擁壁6の山側に比重0.3~0.5の独立間隙を有する多孔質構造の発砲ガラス材により形成された裏込め部7であり、排水層3に接続された裏込め部7とを含む盛土造成構造である。【選択図】図1
To provide an embankment construction structure that can withstand embankment load for a long time.SOLUTION: An embankment construction structure includes a drainage layer 3 formed on a surface layer 2 of a natural ground 1, an embankment construction part 4 formed on the drainage layer 3, drainage pipes 5 that are buried in the embankment construction part 4 and connected to the drainage layer 3, gravity retaining walls 6 installed in close contact with a supporting ground 1A of the natural ground 1, and a backfill part 7 that is formed on the mountain side of the gravity retaining walls 6 by porous expanded glass material with independent gaps with a specific gravity of 0.3 to 0.5, and that is connected to the drainage layer 3.SELECTED DRAWING: Figure 1
【課題】盛土荷重に長期間耐えることが可能な盛土造成構造の提供。【解決手段】地山1の表層部2に形成された排水層3と、排水層3上に形成された盛土造成部4と、盛土造成部4に埋設され、排水層3に接続された排水管5と、地山1の支持地盤1Aに密着させて設置された重力式擁壁6と、重力式擁壁6の山側に比重0.3~0.5の独立間隙を有する多孔質構造の発砲ガラス材により形成された裏込め部7であり、排水層3に接続された裏込め部7とを含む盛土造成構造である。【選択図】図1
EMBANKMENT CONSTRUCTION STRUCTURE
盛土造成構造
HARA YUTAKA (author)
2024-08-30
Patent
Electronic Resource
Japanese
IPC:
E02D
FOUNDATIONS
,
Gründungen
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