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SINTERED MATERIAL AND PROCESS FOR PRODUCING SAME

Abstract

적어도 산화인듐 및 산화갈륨을 함유하는 소결체로서, 체적 14000μm이상의 공극이 0.03체적% 이하인 소결체.

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SINTERED MATERIAL AND PROCESS FOR PRODUCING SAME

Abstract

적어도 산화인듐 및 산화갈륨을 함유하는 소결체로서, 체적 14000μm이상의 공극이 0.03체적% 이하인 소결체.

SINTERED MATERIAL AND PROCESS FOR PRODUCING SAME

Abstract

적어도 산화인듐 및 산화갈륨을 함유하는 소결체로서, 체적 14000μm이상의 공극이 0.03체적% 이하인 소결체.

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Title:

SINTERED MATERIAL AND PROCESS FOR PRODUCING SAME

Additional title:

소결체 및 그의 제조방법

Publication date:

2019-01-23

Type of media:

Patent

Type of material:

Electronic Resource

Language:

Korean

Classification:

IPC: C23C Beschichten metallischer Werkstoffe , COATING METALLIC MATERIAL / C04B Kalk , LIME / H01L Halbleiterbauelemente , SEMICONDUCTOR DEVICES

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