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Ceramic composite for plasma processing apparatus and manufacturing mehtod thereof
An object of the present invention is to provide a ceramic composition for a plasma processing apparatus having enhanced temperature characteristics such as abrasion resistance and thermal conductivity. The present invention relates to a ceramic composition for a plasma processing apparatus and a method for manufacturing the same. The ceramic composition for a plasma processing apparatus according to the present invention is a ceramic composition for a plasma processing apparatus which is produced by mixing ceramic powder and carbon nanotubes (CNT), and the ceramic composition further comprises yttria (Y_2O_3).
본 발명은 플라즈마 처리장치용 세라믹 조성물 및 이의 제조방법에 관한 것이다. 본 발명에 따른 플라즈마 처리장치용 세라믹 조성물은 세라믹 분말과 탄소나노튜브(CNT)를 혼합하여 소성가공되는 플라즈마 처리장치용 세라믹 조성물에 있어서, 상기 세라믹 조성물은 이트리아(YO)를 더 포함하는 것을 특징으로 한다.
Ceramic composite for plasma processing apparatus and manufacturing mehtod thereof
An object of the present invention is to provide a ceramic composition for a plasma processing apparatus having enhanced temperature characteristics such as abrasion resistance and thermal conductivity. The present invention relates to a ceramic composition for a plasma processing apparatus and a method for manufacturing the same. The ceramic composition for a plasma processing apparatus according to the present invention is a ceramic composition for a plasma processing apparatus which is produced by mixing ceramic powder and carbon nanotubes (CNT), and the ceramic composition further comprises yttria (Y_2O_3).
본 발명은 플라즈마 처리장치용 세라믹 조성물 및 이의 제조방법에 관한 것이다. 본 발명에 따른 플라즈마 처리장치용 세라믹 조성물은 세라믹 분말과 탄소나노튜브(CNT)를 혼합하여 소성가공되는 플라즈마 처리장치용 세라믹 조성물에 있어서, 상기 세라믹 조성물은 이트리아(YO)를 더 포함하는 것을 특징으로 한다.
Ceramic composite for plasma processing apparatus and manufacturing mehtod thereof
플라즈마 처리장치용 세라믹 조성물 및 이의 제조방법
BAE KYOUNG JEONG (author)
2018-08-16
Patent
Electronic Resource
Korean
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