A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
SOLUTION PRECURSOR PLASMA SPRAY OF CERAMIC COATING FOR SEMICONDUCTOR CHAMBER APPLICATIONS
Disclosed herein are methods for producing an ultra-dense and ultra-smooth ceramic coating. A method includes feeding a solution comprising a metal precursor into a plasma sprayer. The plasma sprayer generates a stream toward an article, forming a ceramic coating on the article upon contact.
SOLUTION PRECURSOR PLASMA SPRAY OF CERAMIC COATING FOR SEMICONDUCTOR CHAMBER APPLICATIONS
Disclosed herein are methods for producing an ultra-dense and ultra-smooth ceramic coating. A method includes feeding a solution comprising a metal precursor into a plasma sprayer. The plasma sprayer generates a stream toward an article, forming a ceramic coating on the article upon contact.
SOLUTION PRECURSOR PLASMA SPRAY OF CERAMIC COATING FOR SEMICONDUCTOR CHAMBER APPLICATIONS
SUN JENNIFER Y (author) / CHEN YIKAI (author) / LEE CHENGTSIN (author)
2017-10-12
Patent
Electronic Resource
English
Mechanisms of ceramic coating deposition in solution-precursor plasma spray
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