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A restroom system includes a sanitation station configured for hand washing and a waste station configured to receive a waste material from a user. A suds mixture is flowable through the sanitation station and the waste station and is configured for hand washing and to receive the waste material. The suds mixture includes a fluid layer and a suds layer positionable between the fluid layer and the user so that when the suds mixture receives the waste material the suds layer changes from an original shape to absorb energy and allow passage of the waste material through the suds layer into the fluid layer and then returns toward the original shape to form a protective barrier between the user and the waste material in the fluid layer.
A restroom system includes a sanitation station configured for hand washing and a waste station configured to receive a waste material from a user. A suds mixture is flowable through the sanitation station and the waste station and is configured for hand washing and to receive the waste material. The suds mixture includes a fluid layer and a suds layer positionable between the fluid layer and the user so that when the suds mixture receives the waste material the suds layer changes from an original shape to absorb energy and allow passage of the waste material through the suds layer into the fluid layer and then returns toward the original shape to form a protective barrier between the user and the waste material in the fluid layer.
Restroom System
FITZGIBBONS FLOYD (author)
2021-02-18
Patent
Electronic Resource
English
IPC:
E03D
WATER-CLOSETS OR URINALS WITH FLUSHING DEVICES
,
Wasserklosetts oder Urinale mit SpĆ¼lvorrichtungen