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Shear Resistant Drain System for Improving Weak Foundation Soils
Shear drain devices are used to prepare ground with a weak soil layer to receive a static load, for example a structural foundation or a soil embankment, in which the ground includes a weak soil layer that consists of fine grained soils over a base layer. Each shear drain devices each include an elongate perforated pipe member, a surrounding reinforcement member providing tensile reinforcement and aggregate fill. The ground is prepared by (i) inserting the pipe members and reinforcement members in an upright orientation within the fine grained soils such that fluid in the surrounding soil can readily pass into the pipe members and (ii) subsequently placing the aggregate fill in the pipe members to occupy the hollow interior thereof such that the resulting shear drain devices increase a shear strength of the weak soil layer.
Shear Resistant Drain System for Improving Weak Foundation Soils
Shear drain devices are used to prepare ground with a weak soil layer to receive a static load, for example a structural foundation or a soil embankment, in which the ground includes a weak soil layer that consists of fine grained soils over a base layer. Each shear drain devices each include an elongate perforated pipe member, a surrounding reinforcement member providing tensile reinforcement and aggregate fill. The ground is prepared by (i) inserting the pipe members and reinforcement members in an upright orientation within the fine grained soils such that fluid in the surrounding soil can readily pass into the pipe members and (ii) subsequently placing the aggregate fill in the pipe members to occupy the hollow interior thereof such that the resulting shear drain devices increase a shear strength of the weak soil layer.
Shear Resistant Drain System for Improving Weak Foundation Soils
MAKI GORDON CHRISTOPHER (author)
2022-05-12
Patent
Electronic Resource
English
SHEAR RESISTANT DRAIN SYSTEM FOR IMPROVING WEAK FOUNDATION SOILS
European Patent Office | 2022
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European Patent Office | 2022
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