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BONDED SUBSTRATE, AND BONDED SUBSTRATE MANUFACTURING METHOD
A bonded substrate includes a ceramic substrate, a copper plate, and a bonding layer. The ceramic substrate has a main surface having a flat region having a maximum height Rz of 10 μm or less. The ceramic substrate has a particle-defect hole being exposed to the main surface, imparting flatness lower than flatness of the flat region to a part of the main surface, and having a depth of 10 μm or more and 60 μm or less. The copper plate includes a first portion disposed over the flat region and a second portion filling the particle-defect hole. The bonding layer includes a third portion covering the flat region and a fourth portion filling the particle-defect hole, and the second portion and the fourth portion fill 80% or more of a volume of the particle-defect hole. The bonding layer bonds the copper plate to the main surface.
BONDED SUBSTRATE, AND BONDED SUBSTRATE MANUFACTURING METHOD
A bonded substrate includes a ceramic substrate, a copper plate, and a bonding layer. The ceramic substrate has a main surface having a flat region having a maximum height Rz of 10 μm or less. The ceramic substrate has a particle-defect hole being exposed to the main surface, imparting flatness lower than flatness of the flat region to a part of the main surface, and having a depth of 10 μm or more and 60 μm or less. The copper plate includes a first portion disposed over the flat region and a second portion filling the particle-defect hole. The bonding layer includes a third portion covering the flat region and a fourth portion filling the particle-defect hole, and the second portion and the fourth portion fill 80% or more of a volume of the particle-defect hole. The bonding layer bonds the copper plate to the main surface.
BONDED SUBSTRATE, AND BONDED SUBSTRATE MANUFACTURING METHOD
EBIGASE TAKASHI (author)
2022-09-08
Patent
Electronic Resource
English
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