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Refractory object and process of forming a glass sheet using the refractory object
A refractory object can include at least approximately 10 wt % Al2O3 and at least approximately 1 wt % SiO2. In an embodiment, the refractory object can include an additive. In a particular embodiment, the additive can include TiO2, Y2O3, SrO, BaO, CaO, Ta2O5, Fe2O3, ZnO, or MgO. The refractory object can include at least approximately 3 wt % of the additive. In an additional embodiment, the refractory object can include no greater than approximately 8 wt % of the additive. In a further embodiment, the creep rate of the refractory object can be at least approximately 1×10−6 h−1. In another embodiment, the creep rate of the refractory object can be no greater than approximately 5×10−5 h−1. In an illustrative embodiment, the refractory object can include a glass overflow trough or a forming block.
Refractory object and process of forming a glass sheet using the refractory object
A refractory object can include at least approximately 10 wt % Al2O3 and at least approximately 1 wt % SiO2. In an embodiment, the refractory object can include an additive. In a particular embodiment, the additive can include TiO2, Y2O3, SrO, BaO, CaO, Ta2O5, Fe2O3, ZnO, or MgO. The refractory object can include at least approximately 3 wt % of the additive. In an additional embodiment, the refractory object can include no greater than approximately 8 wt % of the additive. In a further embodiment, the creep rate of the refractory object can be at least approximately 1×10−6 h−1. In another embodiment, the creep rate of the refractory object can be no greater than approximately 5×10−5 h−1. In an illustrative embodiment, the refractory object can include a glass overflow trough or a forming block.
Refractory object and process of forming a glass sheet using the refractory object
CITTI OLIVIER (author) / FOURCADE JULIEN P (author) / KAZMIERCZAK ANDREA L (author)
2016-02-02
Patent
Electronic Resource
English
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