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Lanthanum hexaboride sintered body, target and lanthanum hexaboride film each comprising same, and process for production of the sintered body
Disclosed are: a lanthanum hexaboride sintered body which contains lanthanum hexaboride as the main component, has an element nitrogen content of 0.1 to 3 mass % inclusive, contains an impurity composed of element carbon and/or at least two elements selected from La, C, O and B at a content of 0.3 vol % or less, and has a relative density of 88% or more; and a target comprising the lanthanum hexaboride sintered body. An LaB6 sintered body can be provided, which enables the production of a highly pure and dense LaB6 thin film having excellent crystallinity and a good work function and which is suitable for a sputtering target or the like.
Lanthanum hexaboride sintered body, target and lanthanum hexaboride film each comprising same, and process for production of the sintered body
Disclosed are: a lanthanum hexaboride sintered body which contains lanthanum hexaboride as the main component, has an element nitrogen content of 0.1 to 3 mass % inclusive, contains an impurity composed of element carbon and/or at least two elements selected from La, C, O and B at a content of 0.3 vol % or less, and has a relative density of 88% or more; and a target comprising the lanthanum hexaboride sintered body. An LaB6 sintered body can be provided, which enables the production of a highly pure and dense LaB6 thin film having excellent crystallinity and a good work function and which is suitable for a sputtering target or the like.
Lanthanum hexaboride sintered body, target and lanthanum hexaboride film each comprising same, and process for production of the sintered body
TAKAHASHI KENTARO (author) / ANDOU KAZUTO (author)
2016-05-24
Patent
Electronic Resource
English
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