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Metal-free CVD coating of graphene on glass and other dielectric substrates
A catalyst-free CVD method for forming graphene. The method involves placing a substrate within a reaction chamber, heating the substrate to a temperature between 600° C. and 1100° C., and introducing a carbon precursor into the chamber to form a graphene layer on a surface of the substrate. The method does not use plasma or a metal catalyst to form the graphene.
Metal-free CVD coating of graphene on glass and other dielectric substrates
A catalyst-free CVD method for forming graphene. The method involves placing a substrate within a reaction chamber, heating the substrate to a temperature between 600° C. and 1100° C., and introducing a carbon precursor into the chamber to form a graphene layer on a surface of the substrate. The method does not use plasma or a metal catalyst to form the graphene.
Metal-free CVD coating of graphene on glass and other dielectric substrates
LIU XINYUAN (author) / MANLEY ROBERT GEORGE (author) / MORENA ROBERT MICHAEL (author) / SONG ZHEN (author)
2018-05-15
Patent
Electronic Resource
English
IPC:
H01L
Halbleiterbauelemente
,
SEMICONDUCTOR DEVICES
/
C01B
NON-METALLIC ELEMENTS
,
Nichtmetallische Elemente
/
C03C
Chemische Zusammensetzungen für Gläser, Glasuren oder Emails
,
CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS
/
C04B
Kalk
,
LIME
/
C23C
Beschichten metallischer Werkstoffe
,
COATING METALLIC MATERIAL
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