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Thermal stability of perpendicular exchange bias in [Pd/Ferromagnet]N/FeMn films

H.W. Joo, / J. Heo, / H. C. Choi, / M. S. Kim, / S. D. Choi, / C.-Y. You, / K. A. Lee, / S. S. Lee, / D. G. Hwang,

The dependencies of the annealing temperature and the stack number N on perpendicular exchange-biasing(Hex) and coercivity(Hc) in [Pd/Co]N and [Pd/Co (or CoFe)]N/FeMn multilayers were investigated. The surface anisotropy was varied as a function of N with constant bulk anisotropy. It was found that Hex does not depend on the surface anisotropy, while Hc shows a strong dependence. Therefore, it is possible to tailor wide ranges of the Hc (300 ~ 600 Oe) without varying Hex(250 ~ 300 Oe) through the single control parameter stack number N. After annealing the Hc shows peak value at 350 °C in [Pd/Co] multilayers without FeMn, but the peak temperature is down to 250 °C for the exchange biased [Pd/F]N/FeMn samples.

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Thermal stability of perpendicular exchange bias in [Pd/Ferromagnet]N/FeMn films

H.W. Joo, / J. Heo, / H. C. Choi, / M. S. Kim, / S. D. Choi, / C.-Y. You, / K. A. Lee, / S. S. Lee, / D. G. Hwang,

The dependencies of the annealing temperature and the stack number N on perpendicular exchange-biasing(Hex) and coercivity(Hc) in [Pd/Co]N and [Pd/Co (or CoFe)]N/FeMn multilayers were investigated. The surface anisotropy was varied as a function of N with constant bulk anisotropy. It was found that Hex does not depend on the surface anisotropy, while Hc shows a strong dependence. Therefore, it is possible to tailor wide ranges of the Hc (300 ~ 600 Oe) without varying Hex(250 ~ 300 Oe) through the single control parameter stack number N. After annealing the Hc shows peak value at 350 °C in [Pd/Co] multilayers without FeMn, but the peak temperature is down to 250 °C for the exchange biased [Pd/F]N/FeMn samples.

Thermal stability of perpendicular exchange bias in [Pd/Ferromagnet]N/FeMn films

H.W. Joo, / J. Heo, / H. C. Choi, / M. S. Kim, / S. D. Choi, / C.-Y. You, / K. A. Lee, / S. S. Lee, / D. G. Hwang,

The dependencies of the annealing temperature and the stack number N on perpendicular exchange-biasing(Hex) and coercivity(Hc) in [Pd/Co]N and [Pd/Co (or CoFe)]N/FeMn multilayers were investigated. The surface anisotropy was varied as a function of N with constant bulk anisotropy. It was found that Hex does not depend on the surface anisotropy, while Hc shows a strong dependence. Therefore, it is possible to tailor wide ranges of the Hc (300 ~ 600 Oe) without varying Hex(250 ~ 300 Oe) through the single control parameter stack number N. After annealing the Hc shows peak value at 350 °C in [Pd/Co] multilayers without FeMn, but the peak temperature is down to 250 °C for the exchange biased [Pd/F]N/FeMn samples.

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Title:

Thermal stability of perpendicular exchange bias in [Pd/Ferromagnet]N/FeMn films

Contributors:

H.W. Joo, (author) / J. Heo, (author) / H. C. Choi, (author) / M. S. Kim, (author) / S. D. Choi, (author) / C.-Y. You, (author) / K. A. Lee, (author) / S. S. Lee, (author) / D. G. Hwang, (author)

Published in:

2006 IEEE Nanotechnology Materials and Devices Conference ; 1 ; 386-387

Publication date:

2006-10-01

Size:

414485 byte

ISBN:

978-1-4244-0541-1 , 978-1-4244-0540-4

DOI:

https://doi.org/10.1109/NMDC.2006.4388779

Type of media:

Conference paper

Type of material:

Electronic Resource

Language:

English

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