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Model calibration for optical lithography via semidefinite programming
Abstract We apply semidefinite programming to an estimation problem in optical lithography. In this problem, an approximate model of the imaging system is modified so that it satisfies a set of calibration measurements, with the purpose of incorporating into the model distortion effects due to diffusion and etching. The estimation problem is formulated as a semidefinite program, and several techniques are presented for exploiting problem structure in an interior-point method for solving it. These include efficient methods for handling upper bounds on the matrix variables, symmetry constraints on the variables, and low-rank structure in the coefficient matrices.
Model calibration for optical lithography via semidefinite programming
Abstract We apply semidefinite programming to an estimation problem in optical lithography. In this problem, an approximate model of the imaging system is modified so that it satisfies a set of calibration measurements, with the purpose of incorporating into the model distortion effects due to diffusion and etching. The estimation problem is formulated as a semidefinite program, and several techniques are presented for exploiting problem structure in an interior-point method for solving it. These include efficient methods for handling upper bounds on the matrix variables, symmetry constraints on the variables, and low-rank structure in the coefficient matrices.
Model calibration for optical lithography via semidefinite programming
Nouralishahi, Mehrdad (author) / Wu, Clive (author) / Vandenberghe, Lieven (author)
2007
Article (Journal)
English
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