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Defects and Impurities
Abstract The main objective of this chapter is to analyze the influence of the quantum confinement on the electronic levels of point defects and impurities, from quantum wells to quantum dots. In the first two parts, we present the general trends for hydrogenic and deep defects. In the next sections, we consider particular situations: dangling bonds, self-trapped excitons and oxygen related defects at the Si-SiO2 interface.
Defects and Impurities
Abstract The main objective of this chapter is to analyze the influence of the quantum confinement on the electronic levels of point defects and impurities, from quantum wells to quantum dots. In the first two parts, we present the general trends for hydrogenic and deep defects. In the next sections, we consider particular situations: dangling bonds, self-trapped excitons and oxygen related defects at the Si-SiO2 interface.
Defects and Impurities
Dr. Delerue, Christophe (author) / Dr. Lannoo, Michel (author)
2004-01-01
24 pages
Article/Chapter (Book)
Electronic Resource
English
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