A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
Optical Diagnostic Techniques for Low Pressure Plasma Processing
Abstract This paper reviews and compares various optical diagnostic techniques for low pressure plasmas used in etching and deposition processes for microelectronics devices. Optical emission induced by electron-molecule collisions is reviewed. Both space and time-resolved measurements, combined with high-resolution lineshape measurements and rare-gas actinometry have yielded information on radical and ion formation processes, ion motion, etc. Absorption techniques are also covered, including UV, visible and IR absorption, using both lamps and tunable lasers to determine absolute number densities of stable molecules and radicals. Laser-spectroscopic techniques covered include laser-induced fluorescence, laser raman scattering, optogalvanic effects, and tunable IR laser absorption. Surface diagnostic optical techniques are also described briefly, including laser interferometry, ellipsometry, multipass IR absorption, glancing angle reflection absorption, raman scattering, and second harmonic generation. Some of these methods have not yet been employed in plasma environments, but have the potential to yield valuable information.
Optical Diagnostic Techniques for Low Pressure Plasma Processing
Abstract This paper reviews and compares various optical diagnostic techniques for low pressure plasmas used in etching and deposition processes for microelectronics devices. Optical emission induced by electron-molecule collisions is reviewed. Both space and time-resolved measurements, combined with high-resolution lineshape measurements and rare-gas actinometry have yielded information on radical and ion formation processes, ion motion, etc. Absorption techniques are also covered, including UV, visible and IR absorption, using both lamps and tunable lasers to determine absolute number densities of stable molecules and radicals. Laser-spectroscopic techniques covered include laser-induced fluorescence, laser raman scattering, optogalvanic effects, and tunable IR laser absorption. Surface diagnostic optical techniques are also described briefly, including laser interferometry, ellipsometry, multipass IR absorption, glancing angle reflection absorption, raman scattering, and second harmonic generation. Some of these methods have not yet been employed in plasma environments, but have the potential to yield valuable information.
Optical Diagnostic Techniques for Low Pressure Plasma Processing
Donnelly, V. M. (author)
1990-01-01
37 pages
Article/Chapter (Book)
Electronic Resource
English
Review of Diagnostic Techniques for Plasma Jet Characteristics in Plasma Spraying
| British Library Online Contents | 2013
Practical Applications of in-situ Plasma-Etching Diagnostic Techniques
| British Library Online Contents | 1993
Handbook of Advanced Plasma Processing Techniques
| TIBKAT | 2000
| UB Braunschweig | 2016
Atmospheric Pressure Plasma Jet for Glass Processing
| British Library Conference Proceedings | 2005