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Modeling of Laser Chemical Vapor Deposition of Thin Films

Kar, A. / Mazumder, J.

Abstract Laser Chemical Vapor Deposition (LCVD) provides an excellent way of modifying surfaces. The deposition rate is found to be very high in the LCVD technique compared to the conventional Chemical Vapor Deposition (CVD) technique. The usefulness of the deposited film depends on its shape and morphology which are affected by the laser process parameters. This paper presents a mathematical model to study the effects of the laser parameters and processing conditions on the shape and size of the film. In many cases, the film is found to have volcano-like morphology which is also explained by this model.

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Modeling of Laser Chemical Vapor Deposition of Thin Films

Kar, A. / Mazumder, J.

Abstract Laser Chemical Vapor Deposition (LCVD) provides an excellent way of modifying surfaces. The deposition rate is found to be very high in the LCVD technique compared to the conventional Chemical Vapor Deposition (CVD) technique. The usefulness of the deposited film depends on its shape and morphology which are affected by the laser process parameters. This paper presents a mathematical model to study the effects of the laser parameters and processing conditions on the shape and size of the film. In many cases, the film is found to have volcano-like morphology which is also explained by this model.

Modeling of Laser Chemical Vapor Deposition of Thin Films

Kar, A. / Mazumder, J.

Abstract Laser Chemical Vapor Deposition (LCVD) provides an excellent way of modifying surfaces. The deposition rate is found to be very high in the LCVD technique compared to the conventional Chemical Vapor Deposition (CVD) technique. The usefulness of the deposited film depends on its shape and morphology which are affected by the laser process parameters. This paper presents a mathematical model to study the effects of the laser parameters and processing conditions on the shape and size of the film. In many cases, the film is found to have volcano-like morphology which is also explained by this model.

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Title:

Modeling of Laser Chemical Vapor Deposition of Thin Films

Contributors:

Kar, A. (author) / Mazumder, J. (author)

Published in:

Laser Processing: Surface Treatment and Film Deposition ; 203-235

NATO ASI Series ; 307

Publication date:

1996-01-01

Size:

33 pages

ISBN:

978-94-009-0197-1 , 978-94-010-6572-6

ISSN:

DOI:

https://doi.org/10.1007/978-94-009-0197-1_11

Type of media:

Article/Chapter (Book)

Type of material:

Electronic Resource

Language:

English

Keywords:

Physics , Physics, general , Surfaces and Interfaces, Thin Films , Optics, Lasers, Photonics, Optical Devices , Characterization and Evaluation of Materials

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