Oxidative transformations of <Emphasis Type="Italic">p</Emphasis>-chloro- and <Emphasis Type="Italic">p</Emphasis>-fluorostyrene epoxides in the presence of <Emphasis Type="Italic">p</Emphasis>-toluenesulfonic acid: Fid-Bau Portal

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Oxidative transformations of p-chloro- and p-fluorostyrene epoxides in the presence of p-toluenesulfonic acid

Petrov, L. V. / Solyanikov, V. M.

Abstract Mild oxidation of two halogenated styrene epoxides, 2-(4-chlorophenyl)oxirane (CSE) and 2-(4-fluorophenyl)oxirane (FSE), was studied in the presence of p-toluenesulfonic acid (TSA). Hydrogen peroxide and p-chlorobenzaldehyde are the products of CSE oxidation. The kinetics of the overall CSE consumption and oxidation of CSE and FSE are identical to those revealed earlier for the oxidation of styrene epoxide (SE). The consumption and oxidation rates do not depend on the epoxide concentration (zero order) and are proportional to the TSA concentration. At 343 K, the oxidation rate of CSE and FSE are higher than that for SE by factors of 2 and 7, respectively. The introduction of the halogen atoms in the p-position on the phenyl ring accelerates the oxidation.

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Oxidative transformations of p-chloro- and p-fluorostyrene epoxides in the presence of p-toluenesulfonic acid

Petrov, L. V. / Solyanikov, V. M.

Abstract Mild oxidation of two halogenated styrene epoxides, 2-(4-chlorophenyl)oxirane (CSE) and 2-(4-fluorophenyl)oxirane (FSE), was studied in the presence of p-toluenesulfonic acid (TSA). Hydrogen peroxide and p-chlorobenzaldehyde are the products of CSE oxidation. The kinetics of the overall CSE consumption and oxidation of CSE and FSE are identical to those revealed earlier for the oxidation of styrene epoxide (SE). The consumption and oxidation rates do not depend on the epoxide concentration (zero order) and are proportional to the TSA concentration. At 343 K, the oxidation rate of CSE and FSE are higher than that for SE by factors of 2 and 7, respectively. The introduction of the halogen atoms in the p-position on the phenyl ring accelerates the oxidation.

Oxidative transformations of p-chloro- and p-fluorostyrene epoxides in the presence of p-toluenesulfonic acid

Petrov, L. V. / Solyanikov, V. M.

Abstract Mild oxidation of two halogenated styrene epoxides, 2-(4-chlorophenyl)oxirane (CSE) and 2-(4-fluorophenyl)oxirane (FSE), was studied in the presence of p-toluenesulfonic acid (TSA). Hydrogen peroxide and p-chlorobenzaldehyde are the products of CSE oxidation. The kinetics of the overall CSE consumption and oxidation of CSE and FSE are identical to those revealed earlier for the oxidation of styrene epoxide (SE). The consumption and oxidation rates do not depend on the epoxide concentration (zero order) and are proportional to the TSA concentration. At 343 K, the oxidation rate of CSE and FSE are higher than that for SE by factors of 2 and 7, respectively. The introduction of the halogen atoms in the p-position on the phenyl ring accelerates the oxidation.

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Title:

Oxidative transformations of p-chloro- and p-fluorostyrene epoxides in the presence of p-toluenesulfonic acid

Contributors:

Petrov, L. V. (author) / Solyanikov, V. M. (author)

Published in:

Petroleum Chemistry ; 50 ; 437-441

Publication date:

2010-11-01

Size:

5 pages

ISSN:

1555-6239 , 0965-5441

DOI:

https://doi.org/10.1134/S0965544110060058

Type of media:

Article (Journal)

Type of material:

Electronic Resource

Language:

English

Keywords:

Epoxide , Petroleum Chemistry , Oxirane , Order Rate Constant , Carbonyl Oxide Chemistry , Industrial Chemistry/Chemical Engineering

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