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Laser Chemical Vapour Deposition of Titanium-Based Hard Coatings

Conde, O. / Silvestre, A. J. / Paramés, M. L.

Abstract This article is primarily concerned with the laser-assisted chemical vapour deposition (LCVD) of titanium nitride and titanium carbide coatings. The principles of the LCVD technique are briefly outlined and the literature on the LCVD of TiN and TiC films is reviewed. Emphasis is given to the growth mechanisms and to the morphological and structural aspects of the films.

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Laser Chemical Vapour Deposition of Titanium-Based Hard Coatings

Conde, O. / Silvestre, A. J. / Paramés, M. L.

Abstract This article is primarily concerned with the laser-assisted chemical vapour deposition (LCVD) of titanium nitride and titanium carbide coatings. The principles of the LCVD technique are briefly outlined and the literature on the LCVD of TiN and TiC films is reviewed. Emphasis is given to the growth mechanisms and to the morphological and structural aspects of the films.

Laser Chemical Vapour Deposition of Titanium-Based Hard Coatings

Conde, O. / Silvestre, A. J. / Paramés, M. L.

Abstract This article is primarily concerned with the laser-assisted chemical vapour deposition (LCVD) of titanium nitride and titanium carbide coatings. The principles of the LCVD technique are briefly outlined and the literature on the LCVD of TiN and TiC films is reviewed. Emphasis is given to the growth mechanisms and to the morphological and structural aspects of the films.

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Title:

Laser Chemical Vapour Deposition of Titanium-Based Hard Coatings

Contributors:

Conde, O. (author) / Silvestre, A. J. (author) / Paramés, M. L. (author)

Published in:

Laser Processing: Surface Treatment and Film Deposition ; 665-691

NATO ASI Series ; 307

Publication date:

1996-01-01

Size:

27 pages

ISBN:

978-94-009-0197-1 , 978-94-010-6572-6

ISSN:

DOI:

https://doi.org/10.1007/978-94-009-0197-1_34

Type of media:

Article/Chapter (Book)

Type of material:

Electronic Resource

Language:

English

Keywords:

Physics , Physics, general , Surfaces and Interfaces, Thin Films , Optics, Lasers, Photonics, Optical Devices , Characterization and Evaluation of Materials

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