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Strained Layer Epitaxy

Feldman, L. C. / Zinke-Allmang, M. / Bevk, J. / Gossmann, H.-J.

Abstract Strained layer epitaxy is a process for the formation of new materials with a strain and composition modulation in the one to one hundred monolayer range. Two aspects of epitaxial growth are discussed in this paper. We first consider the dynamics of the clustering process, a basic limitation in epitaxy, and show that the formation of clusters can be considered as an Ostwald ripening process. A second experiment examines the strain in few monolayer epitaxial films of Ge embedded in Si(100). We show that the strain in these monolayer films is comparable to that expected from bulk elastic constants.

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Strained Layer Epitaxy

Feldman, L. C. / Zinke-Allmang, M. / Bevk, J. / Gossmann, H.-J.

Abstract Strained layer epitaxy is a process for the formation of new materials with a strain and composition modulation in the one to one hundred monolayer range. Two aspects of epitaxial growth are discussed in this paper. We first consider the dynamics of the clustering process, a basic limitation in epitaxy, and show that the formation of clusters can be considered as an Ostwald ripening process. A second experiment examines the strain in few monolayer epitaxial films of Ge embedded in Si(100). We show that the strain in these monolayer films is comparable to that expected from bulk elastic constants.

Strained Layer Epitaxy

Feldman, L. C. / Zinke-Allmang, M. / Bevk, J. / Gossmann, H.-J.

Abstract Strained layer epitaxy is a process for the formation of new materials with a strain and composition modulation in the one to one hundred monolayer range. Two aspects of epitaxial growth are discussed in this paper. We first consider the dynamics of the clustering process, a basic limitation in epitaxy, and show that the formation of clusters can be considered as an Ostwald ripening process. A second experiment examines the strain in few monolayer epitaxial films of Ge embedded in Si(100). We show that the strain in these monolayer films is comparable to that expected from bulk elastic constants.

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Title:

Strained Layer Epitaxy

Contributors:

Feldman, L. C. (author) / Zinke-Allmang, M. (author) / Bevk, J. (author) / Gossmann, H.-J. (author)

Published in:

The Structure of Surfaces II ; 412-418

Springer Series in Surface Sciences ; 11

Publication date:

1988-01-01

Size:

7 pages

ISBN:

978-3-642-73345-1 , 978-3-642-73343-7

ISSN:

DOI:

https://doi.org/10.1007/978-3-642-73343-7_68

Type of media:

Article/Chapter (Book)

Type of material:

Electronic Resource

Language:

English

Keywords:

Monolayer Film , Angular Scan , Island Height , Dimensional Island , Ostwald Ripening Process Physics , Surface and Interface Science, Thin Films , Surfaces and Interfaces, Thin Films , Crystallography

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