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Dynamical Scaling in a Ni-Si Alloy Undergoing Phase Separation
Abstract The dynamics of the decomposition processes in a Ni-12.5 at.% Si alloy has been studied by the small-angle scattering (SANS) method in the temperature range between 400°C and 550°C. The mode of phase separation, as well as the dynamical scaling behavior, was examined in accordance with existing theories and with computer modelling studies.
Dynamical Scaling in a Ni-Si Alloy Undergoing Phase Separation
Abstract The dynamics of the decomposition processes in a Ni-12.5 at.% Si alloy has been studied by the small-angle scattering (SANS) method in the temperature range between 400°C and 550°C. The mode of phase separation, as well as the dynamical scaling behavior, was examined in accordance with existing theories and with computer modelling studies.
Dynamical Scaling in a Ni-Si Alloy Undergoing Phase Separation
Chen, H. (author) / Polat, S. (author) / Epperson, J. E. (author)
1988-01-01
6 pages
Article/Chapter (Book)
Electronic Resource
English
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