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Development of ozonated ultrapure water supplying system using direct-dissolving method
In LSI and LCD industries, ozonated ultrapure water (O3-UPW) has been applied to wet cleaning processes in order to remove organic and metallic impurities from surfaces of substrates. It has been considered the O3-UPW cannot be distributed to many points of use distant from a dissoving unit, becuse of rapid decrease of dissolved ozone concentration. An O3-UPW supplying system was successfully developed that provides the product with certain concentrations of ozone to points of use. In this system, ozone-containing gas is introduced in ultrapure water (direct dissolving) and the water/gas mixture if transported to many points of use through a piping system. At the point of use, bubbles in the water/gas mixture are separated and O3-UPW without bubbles is supplied to the cleaning equipment. Concentration of dissolved ozone in water rapidly decreases due to self-decomposition. On the other hand, ozone in the gas phase is more stable than in water, and ozone in bubbles is dissolved to water while transported in the piping system. As a result, O3-UPW with O3-concentrations of more than 5 ppm is supplied to cleaning equipment more than 100 m away from the point of ozone gas introduction.
Development of ozonated ultrapure water supplying system using direct-dissolving method
In LSI and LCD industries, ozonated ultrapure water (O3-UPW) has been applied to wet cleaning processes in order to remove organic and metallic impurities from surfaces of substrates. It has been considered the O3-UPW cannot be distributed to many points of use distant from a dissoving unit, becuse of rapid decrease of dissolved ozone concentration. An O3-UPW supplying system was successfully developed that provides the product with certain concentrations of ozone to points of use. In this system, ozone-containing gas is introduced in ultrapure water (direct dissolving) and the water/gas mixture if transported to many points of use through a piping system. At the point of use, bubbles in the water/gas mixture are separated and O3-UPW without bubbles is supplied to the cleaning equipment. Concentration of dissolved ozone in water rapidly decreases due to self-decomposition. On the other hand, ozone in the gas phase is more stable than in water, and ozone in bubbles is dissolved to water while transported in the piping system. As a result, O3-UPW with O3-concentrations of more than 5 ppm is supplied to cleaning equipment more than 100 m away from the point of ozone gas introduction.
Development of ozonated ultrapure water supplying system using direct-dissolving method
Ota, O. (author) / Mizuniwa, T. (author) / Ida, J.I. (author) / Tsukamoto, K. (author) / Morita, H. (author)
2000
10 Seiten, 5 Bilder, 2 Tabellen, 3 Quellen
Conference paper
English
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