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Residual stress field of HIPed silicon nitride rolling elements
The residual stress field of HIPed Si3N4 rolling elements were studied. Two kinds of HIPed Si3N4 ball blanks self-finished at different nominal lapping loads ranging from 1.3 to 10.87 kgf/ball and four kinds of commercially finished 1/2 in (12.7 mm) HIPed Si3N4 balls before, during and after RCF tests were investigated. The experimental results showed that in the finishing process of HIPed Si3N4 rolling elements, the surface and subsurface compressive residual stress induced is proportional to the lapping load applied. There was initially a high compressive residual stress layer on the HIPed Si3N4 ball blanks and this layer is mostly removed during the finishing process. During the rolling contact fatigue process of HIPed Si3N4 rolling elements, the residual stresses on the rolling track will change dramatically as RCF proceeds.
Residual stress field of HIPed silicon nitride rolling elements
The residual stress field of HIPed Si3N4 rolling elements were studied. Two kinds of HIPed Si3N4 ball blanks self-finished at different nominal lapping loads ranging from 1.3 to 10.87 kgf/ball and four kinds of commercially finished 1/2 in (12.7 mm) HIPed Si3N4 balls before, during and after RCF tests were investigated. The experimental results showed that in the finishing process of HIPed Si3N4 rolling elements, the surface and subsurface compressive residual stress induced is proportional to the lapping load applied. There was initially a high compressive residual stress layer on the HIPed Si3N4 ball blanks and this layer is mostly removed during the finishing process. During the rolling contact fatigue process of HIPed Si3N4 rolling elements, the residual stresses on the rolling track will change dramatically as RCF proceeds.
Residual stress field of HIPed silicon nitride rolling elements
Kang, J. (author) / Hadfield, M. (author) / Tobe, S. (author)
Ceramics International ; 28 ; 645-650
2002
6 Seiten, 16 Quellen
Article (Journal)
English
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